Ion implantation in 1.3μm VCSEL structure

LIU Cheng,CAO Chun-fang,LAO Yan-feng,CAO Meng,XIE Zheng-sheng,WU Hui-zhen
DOI: https://doi.org/10.3321/j.issn:1001-9731.2007.08.012
2007-01-01
Abstract:Electrical and optical characterizations of InP and 1.3μm vertical-cavity surface-emitting laser(VCSEL)structure influenced by H+ ion implantation are investigated.The InP material surface is degenerated after ion implantation,and is repaired after thermal annealing above 300℃.The resistance of the layer formed by ion implantation is 104 times that of InP bulk material.Then the 1.3μm VCSEL structure which adopted the ion implantation technology is fabricated.It is found that the optimized thermal annealing temperature is 450℃ and electroluminescence(EL) spectrum intensity is enhanced after high-temperature thermal annealing.
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