Application of Buried Tunnel Junction in Long-Wavelength VCSEL Structure

Cheng Liu,Huizhen Wu,Yanfeng Lao,Zhanchao Huang,Meng Cao
DOI: https://doi.org/10.3969/j.issn.1674-4926.2006.z1.076
2006-01-01
Abstract:S-doped p+-AlInAs-n+-InP and p+-InP-n+-InP tunnel junction structures are grown by gas-source molecular-beam epitaxy (GSMBE) on InP (100) substrates. Distribution of carriers and electrical properties are characterized by electrochemical C-V method and current-voltage characteristics. It is found that p+-AlInAs-n+-InP tunnel junction is superior to p+-InP-n+-InP tunnel junction. Then 1.3 μm vertical-cavity surface-emitting laser (VCSEL) structure which employs p+-AlInAs-n+-InP buried tunnel junction and multiple quantum wells is grown on InP (100) substrates. The VCSEL structure demonstrates low threshold voltage. The gain peak position measured from electro-luminescence is at 1.29 μm at room temperature.
What problem does this paper attempt to address?