Fabrication of Buried Tunnel Junction and Its Application in 1.3 Μm VCSEL Structure

WU Hui-zhen,LIU Cheng,LAO Yan-feng,HUANG Zhan-chao,CAO Meng
DOI: https://doi.org/10.3969/j.issn.1001-3679.2005.05.019
2005-01-01
Abstract:δ-doped p~+-AlInAs-n~+-InP and p~+-InP-n~+-InP tunnel junction structures have been grown by gas-source molecular-beam epitaxy(GSMBE) on InP(100) substrates.Distribution of carriers and electrical properties have been characterized by electrochemical C-V method and current-voltage characteristics.It has been found that p~+-AiInAs-n~+-InP tunnel junction is superior to p~+-InP-n~+-InP tunnel junction.Then 1.3 μm vertical-cavity surface-emitting laser(VCSEL) structure which employs p~+-AlInAs=n~+-InP buried tunnel junction and multiple quantum wells has been grown on InP(100) substrates.The VCSEL structure demonstrates low threshold voltage.The gain peak position measured from electro-luminescence is at 1.29 μm at room temperature.
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