Improvement of Endurance in HZO-Based Ferroelectric Capacitor Using Ru Electrode
Rongrong Cao,Bing Song,D. S. Shang,Yang,Qing Luo,Shuyu Wu,Yue Li,Yan Wang,Hangbing Lv,Qi Liu,Ming Liu
DOI: https://doi.org/10.1109/led.2019.2944960
IF: 4.8157
2019-01-01
IEEE Electron Device Letters
Abstract:In this letter, the endurance property of Hf0.5Zr0.5O2(HZO) based ferroelectric capacitor has been improved using Ru electrodes. Compared to the widely used TiN/HZO/TiN capacitor, the Ru/HZO/Ru capacitor shows comparable remnant polarization (similar to 20 mu C/cm(2)), lower leakage current (5.67x10(-5)A/cm(2)) and higher breakdown electric field (similar to 4 MV/cm) at room temperature. The reduction of the leakage current and the enhancement of the breakdown electric field, which are ascribed to the small number of defects and vacancies in HZO thin films with Ru electrodes, prompt the endurance improvement of HZO-based capacitor from 3 x 10(10) cycles for TiN electrodes at 3 MV/cm to more than 1.2 x 10(11) cycles for Ru electrodes at 3.5 MV/cm. This work provides an effective way to reduce the leakage current and improve the endurance property of HZO-based capacitors.