Properties of Mg-Doped AlGaN Films

Wu Chao,Xie Zili,Zhang Rong,Zhang Zeng,Liu Bin,Liu Qijia,Nie Chao,Li Yi,Han Ping,Chen Peng,Lu Hai
DOI: https://doi.org/10.3969/j.issn.1671-4776.2008.09.005
2008-01-01
Abstract:Mg-doped AlxGa1-xN films were grown on Al2O3 substrate by metal organic chemical vapor deposition(MOCVD) and annealed at 750 ℃ in the atmosphere of N2.Al content was calculated by X-ray ω-2θ scanning,and the result indicates that neither the doping nor the annealing affects the Al content.X-ray rocking curves and AFM images show that the crystal quality becomes worse and the pits on the surface increase as the Mg molar doping concentration increases.However,the annealing improves the morphologies of the samples.Cathode-ray luminescence(CL) was employed,and the decrease of the band-gap peak intensity was observed when the doping concentration increases.After annealing,both the donor-acceptor pair(DAP) emission and the recombination from conduction band to deep acceptor level increase significantly.The result proves that the annealing activates the acceptor impurity of Mg effectively,which is significant to the realization of high efficient p-AlGaN doping.
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