Investigation Of Mg Doping In High-Al Content P-Type Alxga1-Xn (0.3 < X < 0.5)

s r jeon,zhipeng ren,guohong cui,jun su,m gherasimova,junwei han,hyung koun cho,li zhou
DOI: https://doi.org/10.1063/1.1867565
IF: 4
2005-01-01
Applied Physics Letters
Abstract:A study of Mg doping of AlxGa1-xN up to x similar to 50% using microstructural and electrical probes is reported. The viability of effective p-type doping is defined by a minimum concentration of Mg required to offset the background impurities and, more importantly, a maximum limit above which inversion domains and structural defects start to nucleate, accompanied by a rapid degradation of electrical transport. Resistivity of 10 Omega cm and free hole concentrations above 10(17) cm(-3) are achieved for AlxGa1-xN up to x similar to 50% within an optimum window of Mg incorporation. (c) 2005 American Institute of Physics.
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