Microscopic structure of Al0.15 In0.01 Ga0.84 N/In0.2 Ga0.8 N and In0.2 Ga0.8 N/GaN of GaN-based quantum-well
Hui Liao,Weihua Chen,Ding Li,Rui Li,Quanjie Jia,Zhijian Yang,Guoyi Zhang,Xiaodong Hu
2008-01-01
Chinese Journal of Luminescence
Abstract:GaN-based quantum wells are the core structure of optoelectronic devices such as light-emitting diodes, laser diodes. Our experiments show that, In0.2 Ga0.8 N/GaN ternary alloys quantum, wells and Al0.15 In0.01 Ga0.84 N/ In0.2 Ga0.8N quaternary alloy quantum wells, two different quantum well structures for laser diode, have significant differences about the electrical properties and luminous efficiency. In this paper, we study on microscopic characteristics of these two different quantum well stiucture. Through high-resolution X-ray diffraction, we got the satellite peaks of these two different alloys quantum wells by ω/2θ scanning. Using X-ray diflraction, we got the rocking curves by ω scanning of two kinds of MQW's symmetry face (002) and asymnletric face (101), (102), (103), (104), (105) and (201). Through atomic force microscope, photoluminescence spectra and high resolution X-ray diffraction, it revealed the different nature of thp macro factors of the In0.2 Ga0.8 N/GaN ternary alloys and Al0.15 In0.01 Ga0.84 N/In0.2 Ga0.8N quaternary alloys.