Thin Film GaN-Based LEDs on Cu Substrates Fabricated by Laser Lift-Off

Sun Yongjian,Chen Zhizhong,Qi Shengli,Yu Tongjun,Kang Xiangning,Liu Peng,Zhang Guoyi,Zhu Guangmin,Pan Yaobo,Chen Cheng,Li Shitao,Yan Jianfeng,Hao Maosheng
2008-01-01
Abstract:The conventional GaN-based light-emitting diodes(LEDs)on sapphire substrates and laser lift-off(LLO)lateral current structure GaN LED thin film chips on Cu substrates were fabricated.The study results show that after the LLO process,the reverse bias leakage current obviously increases and equivalent parallel resistance decreases 2 orders accordingly.From analysis of I-V curves the fact that tunneling behavior dominates under the reverse bias is confirmed.The AFM image of the conventional LEDs and LLO LEDs after etched reveals that the defect density has no obviously changes after the LLO process.Thereby,the increase of tunneling current should caused by the increase of the defects' tunneling activity after the LLO process.Whereas the similar ideality factors and equivalent series resistance of the LLO-LEDs on Cu and the conventional LEDs on sapphire suggest that the LLO process does not much damage the electrical characteristics at forward bias.The analysis of L-I curves reveals that the LLO process induces more nonirradiation centers.However,the LLO-LEDs show superior performance under large injection current.The LLO-LEDs have 1.8 times greater maximum output power and 2.5 higher current operation capabilities than the conventional LEDs within 300 mA for the good thermal conductivity of Cu.
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