Phase-Change Characteristics and Thermal Stability of GeTe/Sb<sub>2</sub>Te<sub>3</sub>Nanocomposite Multilayer Films

Changzhou Wang,Jiwei Zhai,Zhitang Song,Xi Yao
DOI: https://doi.org/10.1143/JJAP.48.115503
IF: 1.5
2009-01-01
Japanese Journal of Applied Physics
Abstract:GeTe/Sb2Te3 nanocomposite multilayer films were deposited by RF magnetron sputtering on SiO2/Si(100) substrates The temperature dependence of the sheet resistance of multilayer films with various thickness ratios of GeTe to Sb2Te3 was investigated and compared with that of Ge2Sb2Te5. In situ resistance measurements were employed to follow the phase-change process The crystallization temperature and activation energy for the crystallization of multilayer films increased with the thickness ratio of GeTe to Sb2Te3 within the materials The multilayer films possessed the merits of high thermal stability and high crystallization speed The failure tinge for GeTe/Sb2Te3 nanocomposite multilayer films was longer than that for Ge2Sb2Te5 at 110 degrees C We conclude that GeTe/Sb2Te3 nanocomposite multilayer films are good candidates for phase-change random-access memory (PCRAM) applications. (C) 2009 The Japan Society of Applied Physics
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