Effects of Thickness and Si 3 N 4 Coverage on the Phase Transition Characteristics of GeTe Thin Films

Libo Miao,Yegang Lu,Yu Zhang,Wei Sun,Ziyang Hu
DOI: https://doi.org/10.1021/acs.cgd.1c01260
2022-01-18
Abstract:GeTe is one of the most widely used phase-change materials for reconfigurable optical and electrical integrated devices. The development of high-level integration requires scaling down of devices to increase the integration density. However, the influence of thickness and the interfacial effect on the phase-change behavior of GeTe films is still unclear. Here, we study the phase-change properties and thickness reduction of both uncovered and Si3N4-covered GeTe films. With decreasing film thickness, the resistance and optical band gap of the GeTe film remarkably increase, and the thermal stability properties including crystallization temperature and data retention ability are significantly improved because of a larger surface-area-to-volume ratio and a smaller grain size. The crystallization mechanism presents a nucleation-dominated process during the scaling down of the GeTe film. The coverage of Si3N4 further improves the thermal stability, resistance drift, and optical band gap of GeTe. The production of nitrides inhibits the crystallization process. Various orientations of crystal grains appear with different polarization directions under the application of an electric field. These results are of great significance for the design of high-density storage and low-power nonvolatile tunable devices by scaling down phase-change films.
chemistry, multidisciplinary,materials science,crystallography
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