Comparison of Valence Band X-Ray Photoelectron Spectrum Between Al–N-codoped and N-doped ZnO Films
GW Cong,WQ Peng,HY Wei,XX Han,JJ Wu,XL Liu,QS Zhu,ZG Wang,JG Lu,ZZ Ye,LP Zhu,HJ Qian,R Su,CH Hong,J Zhong,K Ibrahim,TD Hu
DOI: https://doi.org/10.1063/1.2171804
IF: 4
2006-01-01
Applied Physics Letters
Abstract:The valence band structures of Al–N-codoped [ZnO:(Al, N)] and N-doped (ZnO:N) ZnO films were studied by normal and soft x-ray photoelectron spectroscopy. The valence-band maximum of ZnO:(Al, N) shifts up to Fermi energy level by about 300 meV compared with that of ZnO:N. Such a shift can be attributed to the existence of a kind of Al–N in ZnO:(Al, N), as supported by core level XPS spectra and comparison of modified Auger parameters. Al–N increased the relative quantity of Zn–N in ZnO:(Al, N), while N–N decreased that of Zn–N in ZnO:N.