X-ray Photoelectron Spectroscopy Study of Al- and N- Co-Doped P-Type ZnO Thin Films

G. D. Yuan,Z. Z. Ye,J. Y. Huang,L. P. Zhu,C. L. Perkins,S. B. Zhang
DOI: https://doi.org/10.1016/j.jcrysgro.2009.01.128
IF: 1.8
2009-01-01
Journal of Crystal Growth
Abstract:The chemical state of nitrogen, aluminum, oxygen and zinc in Al–N co-doped p-type ZnO thin films was investigated by X-ray photoelectron spectroscopy (XPS). N1s peak were detected in both the two p-type ZnO thin films, showing two components. The higher binding energy peak may be due to the Al–NO–H species, and the lower one perhaps derive from the (NH2)− cluster for the ammonia introduction. These two peaks both contribute to the p-type behavior in the ZnO films. A symmetry 74.4eV binding energy in Al2p3/2 photoelectron peaks revealed an Al–N bonding state, a key factor to the co-doping method.
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