Role of polysilicon in poly-Si/SiOx passivating contacts for high-efficiency silicon solar cells
HyunJung Park,Soohyun Bae,Jin Park,Ji Yeon Hyun,Chang Hyun Lee,Dongjin Choi,Dongkyun Kang,Hyebin Han,Yoonmook Kang,Hae-Seok Lee,Donghwan Kim,Se Jin Park
DOI: https://doi.org/10.1039/C9RA03560E
IF: 4.036
2019-11-22
RSC Advances
Abstract:In this study, we focused on understanding the roles of a polysilicon (poly-Si) layer in poly-Si/SiO x /c-Si passivating contacts. Passivating contact formation conditions were varied by changing the doping method, annealing temperature and time, polysilicon layer thickness, and polysilicon doping concentration. Our observations indicated that the roles of polysilicon are contact, in-diffusion barrier action, field effect, gettering, and light absorption. Based on the observations, a i V OC of 741 mV was obtained. Finally, to increase J SC with high V OC , the polysilicon was etched after hydrogenation to reduce light absorption with high passivation quality. i V OC was not affected by etching; moreover, by etching the polysilicon from 300 nm to 60 nm, the cell efficiency increased from 20.48% to 20.59% with increasing J SC , constant V OC , and fill factor.
chemistry, multidisciplinary