Output breakdown characteristics of amorphous InGaZnO thin-film transistors at high gate voltage

Huan Yang,Tengyan Huang,Wengao Pan,Lei Lu,Shengdong Zhang

DOI: https://doi.org/10.1063/5.0188427

IF: 4

2024-02-26

Applied Physics Letters

Abstract:Output characteristics of top-gate amorphous InGaZnO thin-film transistors are investigated at high gate voltage. With the increasing drain voltage, an output breakdown crops up closely following a drastic uprush of drain current. Such dramatically elevated drain current derives from the self-heating (SH) effect-generated channel donors. Measured at different high gate voltages, the output breakdown occurs in either linear or saturation regime, respectively, corresponding to normally-on and normally-off transfer curve, while the SH-triggering powers are almost identical. The conductor-like channel originates from the SH-induced high donor population, while the disconnection between channel and drain is caused by a highly defective region near drain, where the hot-carrier damage is violently activated by the SH-induced high temperature and the high drain electric field in saturation regime.

physics, applied