A Label-Free Measurement Method for Plane Stress States in Optical Isotropic Films with Spectroscopic Ellipsometry

X. Sun,S. Wang,W. Xing,X. Cheng,L. Li,C. Li,Z. Wang
DOI: https://doi.org/10.1007/s11340-023-01026-w
IF: 2.794
2024-01-26
Experimental Mechanics
Abstract:Stress measurement for thin films is crucial in a variety of fields such as in semiconductor manufacturing, the optoelectronics industry, and biomedical science, among others. However, most measurement methods require surface treatment of the thin film.
mechanics,materials science, multidisciplinary, characterization & testing
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