Abstract:The micro-Raman method is a non-contact and non-destructive method for thermal conductivity measurement. To reduce the measurement error induced by the poor fit of the basic equation of the original micro-Raman method, we developed a new basic equation for the heat source of a Gaussian laser beam. Based on the new basic equation, an analytical heat transfer model has been built to extend the original micro-Raman method to thin films with submicrometer- or nanometer-scale thickness. Experiments were performed to measure the thermal conductivity of dielectric thin films with submicrometer- or nanometer-scale thickness. The thermal resistance of the interface between dielectric thin films and their silicon substrate was also obtained. The obtained thermal conductivity of silicon dioxide film is 1.23 W/(m·K), and the interface thermal resistance between silicon dioxide film and substrate is 2.35×10−8 m2·K/W. The thermal conductivity and interface thermal resistance of silicon nitride film are 1.07 W/(m·K) and 3.69×10−8 m2·K/W, respectively. The experimental results are consistent with reported data.

The Research of a Method to Obtain the Optical Parameters of Semiconductor Films

Determination of the Optical Constants of Solar-Control Amorphous Silicon Thin Films on Float Glass

Determination of the optical constants of polymer light-emitting diode films from single reflection measurements

A New Method for Determination of the Optical Constants and Thickness of Thin Film

Application of Spectrophotometry in the Process Parameters Determination of Compound Semiconductor Film

Measurement of Absolute Phase Shift on Reflection of Thin Films Using White-Light Spectral Interferometry

Calculation and analysis of optical parameters of dielectric film by transmission spectrum measurement

Anisotropic Optical Constants Of In-Plane Oriented Polyfluorene Thin Films On Rubbed Substrate

A PRECISE AND SIMPLE METHOD, THE RELATIVE TRANSMISSION FRINGE DEPTH METHOD, OF DETERMINING THE OPTICAL-CONSTANTS AND THICKNESS OF THIN SEMITRANSPARENT FILMS

A Research of Thickness Measurement of Nano-Porous Alumina Films Based on Reflection Spectrum

Modification on Forouhi and Bloomer Model for the Optical Properties of Amorphous Silicon Thin Films

Comparison and Analysis on Measurement of Optical Parameters of Some Semiconductor Films by Two Methods

Study of Annealing Effects Upon the Optical and Electrical Properties of SnO2:F/SiCxOy Low Emissivity Coatings by Spectroscopic Ellipsometry

In Situ Optical Characterizations of the Annealing Effects Upon Sno2: F Films by Spectroscopic Ellipsometry

Accurate Analysis of Ellipsometric Data for Thick Transparent Films

Measurement of the Thermal Transport Properties of Dielectric Thin Films Using the Micro-Raman Method

Thermal conductivity measurement of submicrometer-scale silicon dioxide films by an extended micro-Raman method

Measuring Spectral Reflectance and Transmittance of Heavy Caliber Optical Thin-Film

The on line spectrum measurement in the preparation of thin film

A method to extract absorption coefficient of thin films from transmission spectra of the films on thick substrates

Raman Scattering Characterization of Transparent Thin Film for Thermal Conductivity Measurement