Selecting Alternative Metals for Advanced Interconnects
Jean-Philippe Soulié,Kiroubanand Sankaran,Benoit Van Troeye,Alicja Leśniewska,Olalla Varela Pedreira,Herman Oprins,Gilles Delie,Claudia Fleischmann,Lizzie Boakes,Cédric Rolin,Lars-Åke Ragnarsson,Kristof Croes,Seongho Park,Johan Swerts,Geoffrey Pourtois,Zsolt Tőkei,Christoph Adelmann
2024-10-02
Abstract:Interconnect resistance and reliability have emerged as critical factors limiting the performance of advanced CMOS circuits. With the slowdown of transistor scaling, interconnect scaling has become the primary driver of continued circuit miniaturization. The associated scaling challenges for interconnects are expected to further intensify in future CMOS technology nodes. As interconnect dimensions approach the 10 nm scale, the limitations of conventional Cu dual-damascene metallization are becoming increasingly difficult to overcome, spurring over a decade of focused research into alternative metallization schemes. The selection of alternative metals is a highly complex process, requiring consideration of multiple criteria, including resistivity at reduced dimensions, reliability, thermal performance, process technology readiness, and sustainability. This tutorial introduces the fundamental criteria for benchmarking and selecting alternative metals and reviews the current state of the art in this field. It covers materials nearing adoption in high-volume manufacturing, materials currently under active research, and potential future directions for fundamental study. While early alternatives to Cu metallization have recently been introduced in commercial CMOS devices, the search for the optimal interconnect metal remains ongoing.
Applied Physics,Materials Science