Characterization and Modeling of Silicon-on-Insulator Lateral Bipolar Junction Transistors at Liquid Helium Temperature

Yuanke Zhang,Yuefeng Chen,Yifang Zhang,Jun Xu,Chao Luo,Guoping Guo
2023-09-17
Abstract:Conventional silicon bipolars are not suitable for low-temperature operation due to the deterioration of current gain ($\beta$). In this paper, we characterize lateral bipolar junction transistors (LBJTs) fabricated on silicon-on-insulator (SOI) wafers down to liquid helium temperature (4 K). The positive SOI substrate bias could greatly increase the collector current and have a negligible effect on the base current, which significantly alleviates $\beta$ degradation at low temperatures. We present a physical-based compact LBJT model for 4 K simulation, in which the collector current ($\textit{I}_\textbf{C}$) consists of the tunneling current and the additional current component near the buried oxide (BOX)/silicon interface caused by the substrate modulation effect. This model is able to fit the Gummel characteristics of LBJTs very well and has promising applications in amplifier circuits simulation for silicon-based qubits signals.
Applied Physics
What problem does this paper attempt to address?
The paper aims to address the significant decline in current gain (β) of traditional silicon-based bipolar junction transistors (BJTs) when operating at low temperatures. Specifically, the paper proposes a physically-based compact LBJT model for simulation under 4 K conditions by studying the characteristics of lateral bipolar junction transistors (LBJTs) fabricated on silicon-on-insulator (SOI) substrates at liquid helium temperature (4 K). The model takes into account tunneling current and additional drift-diffusion current components induced by forward SOI substrate bias, which can significantly improve current gain at low temperatures. This enhancement increases the potential application of LBJTs in low-temperature amplifier circuits, particularly in the readout and processing of qubit signals.