The atomic-scale domain wall structure and motion in HfO2-based ferroelectrics: A first-principle study

Weitong Ding,Yuke Zhang,Lingling Tao,Qiong Yang,Yichun Zhou
DOI: https://doi.org/10.1016/j.actamat.2020.07.012
IF: 9.4
2020-09-01
Acta Materialia
Abstract:<p>The HfO<sub>2</sub>-based ferroelectrics have aroused considerable attention due to their potential application in silicon process-compatible memory devices. However, the ferroelectricity origin and the domain evolution have not yet been well understood. It is now generally accepted the orthorhombic <em>Pca</em>2<sub>1</sub> phase is one of ferroelectric phases for HfO<sub>2</sub>. In this work, by performing density functional theory calculations, we systematically studied the domain wall structures and evolution based on the <em>Pca</em>2<sub>1</sub> ferroelectric phase. More specifically, the atomic structures of ten types of possible 180° and 90° ferroelectric domain walls are predicted and explored. And the motion of certain domain walls is expected as the microscopic mechanisms of the polarization switching and ferroelectricity activation of <em>Pca</em>2<sub>1</sub> HfO<sub>2</sub> under external electric field. Our results are in good agreement with the recent experimental results on ferroelectric domain walls in HfO<sub>2</sub>-based epitaxial thin-film and are helpful to understand the ferroelectricity origin of the HfO<sub>2</sub>-based ferroelectrics.</p>
materials science, multidisciplinary,metallurgy & metallurgical engineering
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