First Principle Study on Oxygen Vacancy Induced Ferroelectricity in HFO2-Based Ferroelectrics

Chenxi Yu,Wanwang Yang,Xiaomin Xiao,Fei Liu,Jinfeng Kang
DOI: https://doi.org/10.1109/cstic61820.2024.10531831
2024-01-01
Abstract:HfO2 have attracted much research interest because of its wide application in beyond-moore computing based on the fantastic effects observed in the HfO2-based devices such as resistive switching and ferroelectricity. However, the physical mechanism of ferroelectricity remains elusive. Based on first principle calculations, we propose a new mechanism on the ferroelectricity in HfO2, in which the oxygen vacancies can induce ferroelectricity through symmetry-breaking mechanism. Using first principle methods, we found a stable monoclinic-like ferroelectric M-1 phase with oxygen vacancies in sub-stoichiometric Hf0.5Zr0.5O2-delta system and studied its ferroelectric properties. Our proposed mechanism may provide a new way for characterization and optimization of HfO2-based devices.
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