The Excitation Efficiency for Dislocation-Related Luminescence Centers in Silicon with Oxygen Precipitates

N. A. Sobolev,A. E. Kalyadin,K. F. Shtel’makh,E. I. Shek,V. I. Sakharov,I. T. Serenkov
DOI: https://doi.org/10.1134/s1063782623070187
IF: 0.66
2024-03-14
Semiconductors
Abstract:Effect of the pump power on the photoluminescence intensity for dislocation-related luminescence centers is studied in p -type silicon containing oxygen precipitates. Oxygen precipitates are induced as a result of three-stage annealing used for formation of a getter for fast diffusing impurities in microelectronics technology while D1 and D2 dislocation-related luminescence centers were produced during subsequent annealing in a flow of argon at 1000°C. The photoluminescence excitation efficiencies for the D1 and D2 lines were measured at a temperature of liquid helium.
physics, condensed matter
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