Abstract:Abstract Hydrogenated amorphous carbon (a-C:H) films are capable of providing excellent superlubricating properties, which have great potential serving as self-lubricating protective layer for mechanical systems in extreme working conditions. However, it is still a huge challenge to develop a-C:H films capable of achieving robust superlubricity state in vacuum. The main obstacle derives from the lack of knowledge on the influencing mechanism of deposition parameters on the films bonding structure and its relation to their self-lubrication performance. Aiming at finding the optimized deposition energy and revealing its influencing mechanism on superlubricity, a series of highly-hydrogenated a-C:H films were synthesized with appropriate ion energy, and systematic tribological experiments and structural characterization were conducted. The results highlight the pivotal role of ion energy on film composition, nanoclustering structure, and bonding state, which determine mechanical properties of highly-hydrogenated a-C:H films and surface passivation ability and hence their superlubricity performance in vacuum. The optimized superlubricity performance with the lowest friction coefficient of 0.006 coupled with the lowest wear rate emerges when the carbon ion energy is just beyond the penetration threshold of subplantation. The combined growth process of surface chemisorption and subsurface implantation is the key for a-C:H films to acquire stiff nanoclustering network and high volume of hydrogen incorporation, which enables a robust near-frictionless sliding surface. These findings can provide a guidance towards a more effective manipulation of self-lubricating a-C:H films for space application.

Enhanced adhesion strength and solid lubricity of graphite like amorphous carbon films by hydrogen implantation

Mechanical Properties of Tungsten Doped Amorphous Hydrogenated Carbon Films Prepared by Tungsten Plasma Immersion Ion Implantation

Characterization of microstructure and surface properties of GLC film deposited in plasma nitriding system

Mechanism Of Enhanced Adhesion Between Hydrogenated Amorphous Carbon Films And Tungsten Preimplanted Steel Substrates

Evolution Mechanism of Nanocrystalline Tungsten-Carbon and Effects on Tungsten Implanted Amorphous Hydrogenated Carbon

Improvement of Adhesion Strength of Amorphous Carbon Films on Tungsten Ion Implanted 321 Stainless Steel Substrate

Gas Barrier Properties of Amorphous Hydrogenated Carbon Films by Plasma -Enhanced CVD

Structural and environmental dependence of superlubricious properties in hydrogenated Graphite-Like carbon Films: Implications in solid state lubrication

Fullerene-like Nanostructure Induced Excellent Friction Behavior in High Vacuum Environment for Hydrogenated Carbon Film

Self‐ion Irradiation on Hydrogenated Amorphous Carbon Films at Depth of Adhesion Interlayer: Radiation‐induced Atomic Intermixing and Degraded Film Properties

Tribological performances of a-C films tested on dry nitrogen environment with various Hertz pressures: Failure mechanisms and in-situ formation graphene

Nitrogen Modification of Hydrogenated Amorphous Carbon Films

Structural Investigation And Barrier Properties Of A-C : H Thin Films On Polymer By Pecvd

Structural, mechanical, and tribological properties of GLC film on a nitrided layer prepared in a glow-discharge plasma nitriding system

Study on effect of hydrogen treatment on amorphous carbon film using scanning probe microscopy

Improvement of electron field emission from amorphous carbon films due to hydrogen plasma chemical annealing effect

Nucleation and growth of amorphous carbon film on tungsten-implanted stainless steel substrates

Structure and Tribology of Hard Carbon-Films Synthesized by Ion-Beam Deposition

Improvement of Mechanical and Tribological Performances of Carbon Nanostructure Films by Cryogenic Treatment

Ion energy-induced nanoclustering structure in a-C:H film for achieving robust superlubricity in vacuum

The effect of hydrogen plasma chemical annealing on electron field emission of amorphous carbon films