High linearity AlGaN/GaN HEMTs with Au-free Ti/Al/Ni/Ti ohmic contacts for Ka-band applications

Che-Wei Hsu,Yueh-Chin Lin,Shao-Lun Lee,Kai-Wen Chen,Ying-Ciao Chen,Edward Yi Chang
DOI: https://doi.org/10.35848/1882-0786/ad5949
IF: 2.819
2024-06-19
Applied Physics Express
Abstract:In this study, AlGaN/GaN HEMTs with Au-free Ti/Al/Ni/Ti ohmic contacts were fabricated. The device presents a contact resistance (Rc) of 0.64 Ω·mm and high linearity characteristics. The two-tone measurement at 28 GHz shows that the 2×50 μm device exhibits an excellent third-order intercept point (OIP3) value of 41.64 dBm at VDS = 28 V, and an OIP3/PDC of 24.2. An OIP3 of 46.59 dBm was achieved when the device's gate width was increased to 8×50 μm at VDS = 48 V. These results demonstrate that AlGaN/GaN HEMTs with Ti/Al/Ni/Ti ohmic contacts have potential for Ka-band applications.
physics, applied
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