Electron temperature characterization of H 2 processing plasma by optical emission spectroscopy

Shota Nunomura,Naomichi Ezumi
DOI: https://doi.org/10.35848/1882-0786/ad87aa
IF: 2.819
2024-11-06
Applied Physics Express
Abstract:Optical emission spectroscopy of hydrogen (H 2 ) plasma is performed to characterize the electron temperature, T e . The H 2 Fulcher band emission and radiative dissociation continuum are measured, where the Fulcher band emission is recognized to be T e -sensitive, compared with the dissociation continuum. With this T e -sensitive nature, a simple way of determining T e is proposed, specifically using the intensity ratio of the Fulcher band emission to dissociation continuum. The T e determination is demonstrated for H 2 processing plasmas generated by capacitively coupled discharges at different gas pressures.
physics, applied
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