Origin of two-dimensional hole gas formation on Si-treated diamond surfaces: Surface energy band diagram perspective

Pengfei Qiao,Kang Liu,Sen Zhang,Zhenhua Su,Bing Dai,Jiecai Han,Jiaqi Zhu
DOI: https://doi.org/10.1016/j.apsusc.2022.152560
IF: 6.7
2022-05-01
Applied Surface Science
Abstract:The Si terminal is considered to be able to form two-dimensional hole gas as hydrogen terminal, however, further confirmation of theory and experiments is necessary. In this study, the energy band diagram for the type IIa diamond surface after Si surface treatment was investigated experimentally. The results revealed a Fermi level of 0.2 eV above the valance band maximum, work function of 4.89 eV, and electron affinity of χ=-0.38eV. The energy band diagram of the Si-treated surface was similar to that of a hydrogen-terminated surface, which possesses the suitable chemical potential window facilitating electron transfer from valance band to the aqueous adsorbed layer. Maybe this is the origin of the currently reported C–Si diamond two-dimensional hole gas channel. In addition, the conductivity of Si-treated surface varying with vacuum degrees was observed, and the Hall measurement results showed that hole mobility and concentration are 69 cm2/V∙S and 3.92E+10 cm-2 respectively.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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