Post-synthesis tuning of dielectric constant via ferroelectric domain wall engineering

Lima Zhou,Lukas Puntigam,Peter Lunkenheimer,Edith Bourret,Zewu Yan,István Kézsmárki,Dennis Meier,Stephan Krohns,Jan Schultheiß,Donald M. Evans
DOI: https://doi.org/10.1016/j.matt.2024.04.024
IF: 18.9
2024-05-10
Matter
Abstract:Materials with high dielectric constants are essential for electronic technology, with the values of the dielectric constant typically established during synthesis. Utilizing improper ferroelectric hexagonal ErMnO3 as a template material, Zhou et al. demonstrate that the dielectric constant of a material can be tuned post-synthesis by adjusting the number of insulating domain walls. Furthermore, they show that these insulating domain walls exhibit ideal capacitor behavior, enabling the authors to predict the optimal configuration for maximizing a material's dielectric constant with insulating domain walls.
materials science, multidisciplinary
What problem does this paper attempt to address?