Giant Dielectric Permittivity in Ferroelectric Thin Films: Domain Wall Ping Pong.

An Quan Jiang,Xiang Jian Meng,David Wei Zhang,Min Hyuk Park,Sijung Yoo,Yu Jin Kim,James F. Scott,Cheol Seong Hwang
DOI: https://doi.org/10.1038/srep14618
IF: 4.6
2015-01-01
Scientific Reports
Abstract:The dielectric permittivity in ferroelectric thin films is generally orders of magnitude smaller than in their bulk. Here, we discover a way of increasing dielectric constants in ferroelectric thin films by ca. 500% by synchronizing the pulsed switching fields with the intrinsic switching time (nucleation of domain plus forward growth from cathode to anode). In a 170-nm lead zirconate titanate thin film with an average grain size of 850 nm this produces a dielectric constant of 8200 with the maximum nucleus density of 3.8 μm−2, which is one to three orders of magnitude higher than in other dielectric thin films. This permits smaller capacitors in memory devices and is a step forward in making ferroelectric domain-engineered nano-electronics.
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