Improvement of the Electrical Performance of Ag/MEH-PPV/SiNWs Schottky Diode by the Insertion of a Thin Layer of MEH-PPV Polymer and Study of the Annealing Effect

Rahmani, M.
DOI: https://doi.org/10.1007/s10904-023-02553-8
IF: 3.518
2023-02-07
Journal of Inorganic and Organometallic Polymers and Materials
Abstract:Poly[2-methoxy-5-(2′-ethylhexyloxy)-1,4-phenylene vinylene] (MEH-PPV) thin layer was deposited on silicon nanowires (SiNWs) by electroless dipping method. SiNWs were obtained using Ag-assisted chemical etching process. Scanning Electron Microscopy (SEM) images reveal a vertical alignment of the SiNWs as well as the formation of MEH-PPV layer on their surfaces. The presence of MEH-PPV polymer on the SiNWs surface was confirmed by Energy-dispersive X-ray (EDX). Current–Voltage (I–V) measurements were performed for the electrical characterization of Ag/MEH-PPV/SiNWs diodes before and after annealing. The ideality factor (n), the barrier height (φ b ) and the series resistance (R S ) are determined using the Cheung method. The diode parameters are strongly affected by the immersion duration in MEH-PPV solution as well as the annealing temperature. The rectification rate of the diodes was increased by MEH-PPV deposition. The annealing temperature has a great influence on the diode parameters by the thermal activation of carriers at Ag/MEH-PPV and MEH-PPV/SiNWs interfaces. I–V characteristics show an ohmic character for temperatures above 250 °C. The electrical parameters such as equivalent carrier concentration (N D ) and built-in voltage (V b ) and other values of φ b are calculated from Capacitance–Voltage (C–V) measurements.
polymer science
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