Silicon cell for the precise measurement of thermal expansion at low temperatures: Results for Cu and NaF

R. Villar,M. Hortal,S. Vieira
DOI: https://doi.org/10.1063/1.1136050
IF: 1.6
1980-01-01
Review of Scientific Instruments
Abstract:A three terminal capacitance dilatometer for low temperatures is reported in which the expansivity of a sample is compared to that of silicon, a material of very small expansivity at low temperatures. The thermal expansion of a standard copper sample is measured down to 3 K and the results compared with other authors. Values for the linear thermal expansion coefficient of a pure NaF single crystal below 5 K are reported for the first time.
instruments & instrumentation,physics, applied
What problem does this paper attempt to address?