Abstract:Thin coatings of Cr2O3 have been used for numerous applications. Selective oxidation of chromium will be beneficial for integrated device fabrications. Thin coatings of pure chromium were vacuum deposited on a glass substrate using hot electrons from tungsten filament. These coatings were then treated with nanosecond and femtosecond laser in ambient conditions. The microstructure, morphology and the color of the coatings treated with laser sources were modified and there was a formation of an oxide layer due to the heat dissipation on the chromium coating from the energetic photons. High-resolution scanning electron microscope studies showed the morphological evolution, which is directly correlated with the laser fluence of both the nanosecond and femtosecond lasers. This morphological evolution was accompanied by the microstructural change as observed from the X-ray diffraction patterns. The chromaticity response of the coating was studied by UV–Vis spectroscopy and the response of the coating in the visible region evolved with the laser fluences. The divergence in chromaticity of these two laser treatments, is due to the difference in morphology as the result of the varied pulse duration. It could be concluded that the morphology had effect on the chromaticity of the films. Futhermore, Rutherford backscattering depth profiling of the laser treated coatings revealed the diffusion of oxygen atoms in the coating as a result of laser treatment fluence. We have analyzed both the optical and material properties of the laser induced oxidation and demonstrated laser writing as a promising tool to selectively oxidize Chromium for integrated device applications.

Chromium Oxide Thin Films Prepared by Chemical Vapor Deposition from Chromium Acetylacetonate and Chromium Hexacarbonyl

Deposition of Y2O3 stabilized ZrO2 thin films from Zr(DPM)4 and Y(DPM)3 by aerosol-assisted MOCVD

Chromium oxide films fabricated by Cr(CO)6 chemical vapor deposition

Silicon Dioxide Deposition by Atmospheric Pressure and Low‐Temperature CVD Using TEOS and Ozone

Atomic layer deposition of chromium oxide—An interplay between deposition and etching

Study of chromium oxide film growth by chemical vapor deposition using infrared reflection absorption spectroscopy

Mechanical and Optical Properties of Cr2O3 Thin Films Grown by Atomic Layer Deposition Method Using Cr(thd)3 and Ozone

Preparation of Self-Healing Α-Al2o3 Films by Low Temperature Thermal Oxidation

CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS

Preparation and Characterization of Α-Al2o3 Film by Low Temperature Thermal Oxidation of Al8Cr5 Coating

Preparation of Chromium Oxide Coatings on Aluminum Borate Whiskers by a Hydrothermal Deposition Process

Mist CVD-based growth of crystalline alpha chromium oxide (α-Cr2O3) on c-plane sapphire substrate with chromium acetylacetonate as a precursor

Al-Cr Coatings Prepared by Diffusion at Low Temperature and Its Phase Characterization

Chromium oxide formation on nanosecond and femtosecond laser irradiated thin chromium films

Cr2O3 thin films grown at room temperature by low pressure laser chemical vapour deposition

Microporous Textured Titanium Dioxide Films Deposited at Atmospheric Pressure Using Dielectric Barrier Discharge Assisted Chemical Vapor Deposition

Tuning the Morphology and Composition of Ultrathin Cobalt Oxide Films Via Atomic Layer Deposition

CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties

Influence of Water Concentration on High-Temperature Reactive Condensation of Chromium Vapors Generated in 800°C Air

Facile Fabrication of Composite Vanadium Oxide Thin Films with Enhanced Thermochromic Properties

Preparation Of Alpha-Al2o3 Thin Films By Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition And Heat Annealing