Study of chromium oxide film growth by chemical vapor deposition using infrared reflection absorption spectroscopy

V. M. Bermudez,W. J. DeSisto
DOI: https://doi.org/10.1116/1.1339008
2001-03-01
Abstract:Polarization-modulated infrared reflection absorption spectroscopy (aided by numerical modeling) is demonstrated as a potentially useful tool for the study of the chemistry of materials growth and processing under steady-state conditions. This approach is applied to a preliminary investigation of the growth of Cr oxide films at low-temperature (⩽270 °C) on Al2O3 using Cr(CO)6 and O2. The use of a buried metal layer and of polarization modulation enables detection of surface species with good sensitivity in the presence of strong absorption by gas-phase molecules. Cr(CO)6 weakly interacting with Al2O3 and Cr oxide surfaces has been observed under equilibrium conditions, and a desorption energy of ∼11 kcal/mol has been deduced from the temperature-dependent intensity of the v6(t1u) carbonyl stretching mode. The 735 cm−1 longitudinal optic mode of Cr2O3 is observed during steady-state growth and simulated using the multilayer Fresnel relations for polarized reflectance. The growth is found to be first order in the Cr(CO)6 pressure under the present conditions.
physics, applied,materials science, coatings & films
What problem does this paper attempt to address?