Structural and optical properties of silicon oxycarbide thin films using silane based precursors via sol-gel process

Soma Hansda,Dipika Sarkar,Sukanya Kundu,Ajitesh Kar,Subhankar Bera,Sanjiban Das,Dipayan Sanyal,Milan K. Naskar
DOI: https://doi.org/10.1016/j.tsf.2024.140226
IF: 2.1
2024-01-25
Thin Solid Films
Abstract:Silicon oxycarbide (SiC x O y ) is a candidate material for white luminescence. This work investigates the formation of SiC x O y thin film coating by sol-gel route using various silanes namely, methyltrimethoxy silane (MTMS) with or without using tetraethyl orthosilicate, vinyltrimethoxysilane and polydimethyl siloxane, followed by calcination at 1000 °C/1 h under Ar atmosphere. The structural and optical properties of the developed films were studied by X-ray diffractomete (XRD), Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FESEM), electron paramagnetic resonance (EPR) spectroscopy and Photoluminescence (PL). XRD plot shows amorphous nature of silicon oxycarbide (SiC x O y ) while FTIR reveals Si-C band at 795 cm −1 and Si-O-Si band at 1085 cm −1 confirming the presence of SiC x O y . XPS analysis of MTMS derived coating revealed stoichiometry of SiC 0.3 O 2.25 which is comparable to SiC x O y (0.2<x<0.6, analysis="" be="" bond="" cause="" center="" could="" epr="" in="" luminescence="" of="" presence="" probable="" shows="" si-dangling="" sic<sub="" spectra="" the="" which="" y xO y as observed from PL study. FESEM shows uniform coating of thickness ∼200 nm. PL spectra shows blue and green emission peaks at ∼ 403–452 and ∼ 483–560 nm, respectively.</x
materials science, multidisciplinary,physics, applied, condensed matter, coatings & films
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