Abstract:In our work, silicon and silica composite films were prepared by using a magnetron sputtering method, and the samples were annealed in the temperature range between 200 degrees C and 600 degrees C. After annealing, the samples were investigated by spectroscopic ellipsometry (SE), and the SE spectra were measured in the range of 1.5 eV similar to 4.5 eV with a dual-rotating-element ellipsometer. In order to investigate the microstructure information of the film by fitting the SE spectra using the effective-medium approximation (EMA), we modeled the whole film by using a multilayer optical model including a surface oxide layer, a composite layer, and substrate layer. We used different mixtures to describe the composite layer, and finally we found that a mixture of amorphous silicon (a-Si), polycrystalline silicon (p-Si), and silicon dioxide had the best fit to the SE spectra. Whereafter, we studied the dependences of the surface roughness, the layer structure, and the composition on the different annealing temperatures and found that with increasing annealing temperature, the surface oxide layer grew in thickness, the silicon dioxide maintained its volume fraction, and a-Si transferred to p-Si.

Spectroscopic Ellipsometric Study of Size-Controlled Silicon Nano-Crystals in Sio2 Composite Thin Film

Study of Crystallization and Phase Mixing in Sio2/Siox Superlattices Through Form Birefringence Measurements

Size-Dependent Optical Absorption of Silicon Nanocrystals Embedded in Sio2/Si3n4 Hybrid Matrix

Ellipsometric Study of the Optical Properties of Silicon-Based Si : Sio2 Composite Thin Films under Different Annealing Temperatures

Optical Properties Study of Silicon Oxynitride Films Deposited by RF Magnetron Sputtering

Optical Constants and Band Gap Expansion of Size Controlled Silicon Nanocrystals Embedded in SiO2 Matrix

Spectroscopic Ellipsometry Characterization of Optical Properties for Sol-Gel Derived SiO2 Film

Influence of Nanocrystal Size on Dielectric Functions of Si Nanocrystals Embedded in SiO2 Matrix

Size dependence of refractive index of Si nanoclusters embedded in SiO2

Optical-Property Profiling of SiO<sub>2</sub> Films Containing Si Nanocrystals Formed by Si<sup>+</sup> Implantation

Temperature Dependent Optical Properties of Si Nanocrystals Embedded in SiO 2 Matrix

Profile of Optical Constants of Sio2 Thin Films Containing Si Nanocrystals

Efficient Sensitized Photoluminescence of Er Silicate in Silicon Oxide Films Embedded with Amorphous Silicon Clusters, Part I: Fabrication

Structure and optical properties of SiO2 films containing Ge nanocrystallites

Measurement and Study on Optical Properties of Nano-crystalline Silicon Films

Size and density control of Si-nanocrystals realized by SiOx/SiO2 superlattice

Optical Properties of SiO_2 Films with Nano-silicon Crystal Grains Embedded

Optical and Structural Characterization of SnO2:F/SiCxOy Tandem Thin Films by Spectroscopic Ellipsometry

Optical properties and their depth profiling of Si nanocrystals embedded in SiO2 matrix

Evolution of Optical Constants of Silicon Dioxide on Silicon from Ultrathin Films to Thick Films

Study of the Optimal Film Structure by Using Conventional Ellipsometry