Optical and stress properties of ZrO_2/SiO_2 and TiO_2/SiO_2 anti-reflective coatings deposited by ion-beam-assisted deposition on a flexible substrate

Hsi-Chao Chen,Chun-Hao Chang,Kun-Hong Chen

DOI: https://doi.org/10.1364/ao.540615

IF: 1.9

2024-11-01

Applied Optics

Abstract:Hsi-Chao Chen, Chun-Hao Chang, Kun-Hong Chen Dielectric films of Z r O _2,T i O _2, and S i ... [Appl. Opt. 63, 8280-8287 (2024)]

optics

What problem does this paper attempt to address?

Study on the Mechanism and Measurement of Stress of Tio2 and Sio2 Thin-Films

Gu Pei-Fu,Zheng Zhen-Rong,Zhao Yong-Jiang,Liu Xu

DOI: https://doi.org/10.7498/aps.55.6459

IF: 0.906

2006-01-01

Acta Physica Sinica

Abstract:The stress of TiO2 and SiO2 thin films has been researched, including stress model, measurement method and experimental results for different preparation conditions. Based on the model of curvature of deformed substrate, the stress of the films deposited with and without ion assist as well as with different substrate temperature has been measured and some useful results for both single layers and multilayer system of TiO2 and SiO2 have been obtained. The effect of packing density of the layer on stress is found as follows: the film with lower packing density shows a tensile and that with high pacing density shows a compress stress. The accumulated stress in multilayer system even can be diminished to zero by adjusting the preparation parameters.
Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Yanghui Li,Weidong Shen,Yueguang Zhang,Xiang Hao,Huanhuan Fan,Xu Liu

DOI: https://doi.org/10.3788/col201311.s10205

IF: 2.56

2013-01-01

Chinese Optics Letters

Abstract:Trimethylamine (TMA), TiCl4, and water are applied as the precursors to deposit Al2O3 and TiO2. With different substrate temperatures, the optical properties and surface morphologies of the two oxides TiO2 and SiO2 are studied, respectively. With substrate temperature of 120 oC, amorphous TiO2 can be obtained, and the surface roughness (RMS) is only 0.928 nm. Applying Al2O3 and TiO2 deposited in 120 oC as low and high refractive index materials, anti-reflection (AR) coating at single point (550 nm) is designed. Furthermore, with the calibrated growth rates, this AR coating is fabricated, and its ultimate reflectance for the AR coating at 550 nm is less than 0.2%, which can meet the requirement for most applications.
PREPARATION AND TRIBOLOGICAL PROPERTIES OF TiO2-ZrO2 THIN FILMS

陈云霞,周金芳,刘维民

DOI: https://doi.org/10.3321/j.issn:1005-3093.2002.03.012

2002-01-01

Abstract:High oriented TiO2-ZrO2 thin films were prepared with sol-gel process followed by dip-coating the ethanol solution of zirconium oxychloride and titanium tetrachloride. The microstruc-ture, morphology and tribological properties of TiO2-ZrO2 thin films were investigated using AFM, XPS, XRD and dynamic-static tribometer. The results show that the TiO2 -ZrO2 films are dense, homogeneous and in a complete tetragonal phase; which display an excellent antiwear and friction reduction performance. Under 0.5 N applied load, the friction coefficient is only 0.14~0.20 and the an-tiwear life is more than 5000 sliding cycles for the TiO2-ZrO2/AISI 52100 steel and TiO2-ZrO2/Si3N4 systems.
The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

T Zou,H Ye,WD Shen,ZR Shen,Y Zhu

DOI: https://doi.org/10.1117/12.576370

2005-01-01

Abstract:ZnO were deposited on sapphire and silicon substrates by RF magnetron sputtering from a metallic zinc target. The structural and optical propertied of ZnO films were studied by X-ray diffraction, and UV-VIS-NIR scanning spectrophotometer. XRD measurements show ZnO films had a preferential orientation along the c-axis. Only one peak, (002) phase, appears on the diffraction spectra. The transmittance spectra indicate that ZnO films possessed a transmittance of about 80% in the visible region and a sharp absorption edge at wavelength of about 390nm. The refractive index n and the extinction coefficient k are all sensitive to the oxygen partial pressure and the substrate temperature. Furthermore, based on the ideal five layers symmetrical waveguide films, the relationships of the loss and the thickness of the waveguide layer and the buffer layer were analyzed using ZnO as waveguide layer and SiO2 as buffer layer.
Optical Properties of Thin Oxide Films Produced by Energetic Ion Beams

Peng Guo,Shusen Zheng

1999-01-01

Abstract:The optical properties of single layers of ZrO 2 and TiO 2 deposited by dual ion beam sputtering or by ion assisted e beam evaporation on unheated substrates were reported. The process parameters and the information on the experimental setup were given in some detail. The energetic ion beam processes have been used for producing multilayer thin films like antireflection coatings and short wave filters.
Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

XIA Qi-ping,WANG Xiao-xiao,LV Jian-guo,SONG Xue-ping,SUN Zhao-qi

DOI: https://doi.org/10.16553/j.cnki.issn1000-985x.2011.02.006

2011-01-01

Abstract:The c-axis preferred orientation ZnO films was deposited on quartz and Si substrates using RF reactive magnetron sputtering.The O2∶Ar flow ratio was 10∶40,20∶40,30∶40 and 40∶40 during the magnetron sputtering process.The microstructure and optical properties of ZnO films were investigated by X-ray diffraction,stylus profilometer,atomic force microscope and ultraviolet-visible spectrum.The results indicated that ZnO films prepared at 30∶40 had the best crystal quality.The average transmission of ZnO thin films are above 87%.As the O2∶Ar ratio increasing,the transmission of ZnO thin films change non-monotonically and reach a maximum of above 93% at 30∶40.The optical band gap of ZnO films first increases and then decreases as O2∶Ar ratio increasing.Compared with the optical band gap(3.37 eV) of buck ZnO,the band gap of all ZnO films become narrow.
Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering

Wenjia Yuan,Weidong Shen,Xiaowen Zheng,Chenying Yang,Yueguang Zhang,Bo Fang,Wen Mu,Chaonan Chen,Xu Liu

DOI: https://doi.org/10.3788/AOS201737.1231001

2017-01-01

Acta Optica Sinica

Abstract:The optical and mechanical properties and the microstructures of Nb2O5,Ta2O5 and SiO2 thin films prepared by the ion beam sputtering (IBS) method are studied.The effect of the assisted ion source voltage on the film properties is analyzed.The comparison among films prepared by the electron beam evaporation,ion beam assisted deposition and IBS is also conducted.The study results show that the films prepared by IBS possess better optical performance and microstructures,as well as higher compressive stress,hardness and Young modulus.The assisted ion source is beneficial to improving the optical performance,adjusting the film stress and reducing the surface roughness of thin films,however,it has relatively small influence on the hardness and the Young modulus.Under different assisted ion source voltages,the stress of prepared Nb2 O5 by IBS is-152--281 MPa,that of Ta2O5 is-299--373 MPa and that of SiO2 is-427--577 MPa.Under proper process parameters,the extinction coefficient can be smaller than 10-4 and the film surface is smooth with a root mean square roughness of smaller than 0.2 nm.
Optical and anisotropic stress properties of flexible (Ta2O5/SiO2)2 antireflection film deposited by E-gun evaporation with ion-beam assisted deposition

Kun-Hong Chen,Kuo C. Kai,Chen H. Chao,Chen S. Bin,Chen G. Yu,Wu T. Tse

DOI: https://doi.org/10.1117/12.2616275

2021-10-27

Abstract:The research proposal was used tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2) as the high and low refractive index for the multilayer anti-reflection (AR) films were deposited on a flexible polyethylene terephthalate (PET) by electron-beam evaporator with ion-beam assisted deposition (IAD). The optical and stress properties of these multilayer (Ta2O5/SiO2)2 films were investigated. A homemade Phase shadow moiré interferometer was used to measure the stresses of single and multilayer films. The experimental results show the optimal oxygen pressure of Ta2O5 and SiO2 were 8 and 25 sccm, respectively for the multilayer AR coating with electron-beam evaporator. The residual stress of the multilayer film stacks changed gradually from tension to compression stresses which +3,167 MPa was for the first layer and -438 MPa for the fourth layer.
ZrO2-TiO2 thin films: A new material system for mid-infrared integrated photonics

Ningyuan Duan,Hongtao Lin,Lan Li,Juejun Hu,Lei Bi,Haipeng Lu,Xiaolong Weng,Jianliang Xie,Longjiang Deng

DOI: https://doi.org/10.1364/OME.3.015370

2013-01-01

Optical Materials Express

Abstract:Mid-infrared (MIR, 2 - 6 mu m wavelength) transparent metal oxides are attractive materials for planar integrated MIR photonic devices and sensing applications. In this report, we present reactive sputtering deposited ZrO2-TiO2 (ZTO) thin films as a new material candidate for integrated MIR photonics. The material structure and optical properties were systematically studied as a function of Ti concentration. The thin film index of refraction monotonically increases with Ti concentration, while the film crystallinity decreases. Fully amorphous ZTO films were achieved with 40 at.% Ti doping on various substrates. MIR micro-disk resonators on MgO substrates were demonstrated using Zr0.6Ti0.4O2 strip-loaded waveguides with a loaded quality factor of similar to 11,000 at 5.2 mu m wavelength. (c) 2013 Optical Society of America
Characterization of SiO2 and TiO2 films prepared using rf magnetron sputtering and their application to anti-reflection coating

Sang-Hun Jeong,Jae-Keun Kim,Bong-Soo Kim,Seok-Ho Shim,Byung-Teak Lee

DOI: https://doi.org/10.1016/j.vacuum.2004.06.003

IF: 4

2004-11-01

Vacuum

Abstract:Preparation of TiO2 and SiO2 films for optical applications was attempted using conventional rf magnetron sputtering in the sputtering ambient with various O2/Ar+O2 ratios and at substrate temperatures between room temperature and 400°C. X-ray photoelectron spectroscopy (XPS) and optical spectroscopy investigations indicated that oxygen addition in the sputtering ambient was essential for growing TiO2 films with stoichiometric compositions and good transmittance, while SiO2 films had a stoichiometric composition of O/Si ratio=2.1–2.2 and were highly transparent in the visible wavelength region, independent of gas composition in the growing ambient. It was also identified from scanning electron microscope (SEM), atomic force microscope (AFM) and Fourier transform infrared spectroscopy (FTIR) measurements that the structural characteristics of both TiO2 and SiO2 films were significantly improved with O2 addition in the sputtering ambient, showing smoother surface morphologies and higher resistances to water absorption when compared with films grown without O2 addition. Heating of the substrate between 200 and 400°C considerably increased the refractive index of TiO2 layers, resulting in dense structures along with an improvement of crystallinity. For optical applications, AR coatings composed of 2–4 multi-layers on glass were designed and manufactured by stacking in turn the SiO2 and TiO2 films at room temperature and O2/Ar+O2=10%, and the performance of the produced coatings was compared with simulation results.

materials science, multidisciplinary,physics, applied
Infrared And Raman Spectroscopic Studies Of Optically Transparent Zirconia (Zro2) Films Deposited By Plasma-Assisted Reactive Pulsed Laser Deposition

Wei Zhang,Jie Gan,Zhigao Hu,Wenlei Yu,Qian Li,Jian Sun,Ning Xu,Jiada Wu,Zhifeng Ying

DOI: https://doi.org/10.1366/10-06198

2011-01-01

Applied Spectroscopy

Abstract:Plasma-assisted pulsed laser deposited zirconia (ZrO2) films were studied by Fourier transform infrared (FT-IR) and Raman spectroscopy for structural characterization and thermal stability in combination with optical characterization by spectroscopic ellipsometry and optical transmission measurements. Only the monoclinic ZrO2 phase was positively identified from the infrared and Raman spectra of the as-deposited ZrO2 films, which show excellent optical transparency from the ultraviolet to the near infrared as revealed by optical characterization. The as-deposited ZrO2 films are free of any SiOx interfacial layer when deposited on silicon. The prepared ZrO2 films exhibit good thermal stability in their structural, optical, and interfacial properties up to 900 degrees C. Upon annealing above 1100 degrees C, a silicon oxide interfacial layer forms due to the oxidation of the silicon substrate surface by the oxygen diffused from the oxide film to the silicon substrate at high temperatures.
Effect of ionic oxygen concentration on properties of SiO2 and Ta2O5 monolayers deposited by ion beam sputtering

Chang Chen,Yanzhi Wang,Jijun Feng,Zhihao Wang,Yu Chen,Yesheng Lu,Yuhui Zhang,Dawei Li,Yun Cui,Jianda Shao

DOI: https://doi.org/10.1016/j.optmat.2022.113349

IF: 3.754

2023-02-01

Optical Materials

Abstract:Optical thin films with ultralow absorption loss are crucial for high-precision optical systems. The ionic oxygen concentration and oxygen flow rate play decisive roles in the absorption loss of the film. We prepared SiO2 and Ta2O5 monolayers using a double-ion beam sputtering (DIBS) deposition system and studied the effects of different ionic oxygen concentrations and oxygen flow rates on the optical constants, weak absorption, –OH defects, and dispersion energy parameters. The results show that the oxygen flow slightly affects the weak absorption of SiO2 films, while a higher ionic oxygen concentration facilitates the reduction of the absorption loss of SiO2 films, resulting in fewer –OH defects. A higher ionic oxygen concentration decreases the refractive index of the Ta2O5 films. The relatively low lattice permittivity of the Ta2O5 films may be attributed to the argon bubbles wrapped in the film. Annealing can reduce the absorption of the film but cannot improve its surface roughness. A Ta2O5/SiO2 high-reflection film was produced with an optimal ionic oxygen concentration and oxygen flow rate, with the lowest absorption loss for both materials. The weak absorption attained 1.4 ppm, playing a significant role in improving the performance of the high-power and high-precision optical systems.

materials science, multidisciplinary,optics
Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region

Roland Thielsch,Alexandre Gatto,Norbert Kaiser

DOI: https://doi.org/10.1364/ao.41.003211

2002-06-01

Abstract:Mechanical stress and the structures of SiO2, Al2O3, and HfO2 single oxide layers and of high-reflection multilayer coatings deposited by reactive evaporation, plasma ion-assisted deposition, and ion-beam sputtering have been studied. The stress was related to the microstructure and to the incorporation of water by means of infrared spectroscopy. From the slopes of measured stress-temperature curves of these coatings deposited onto two substrate materials (silicon and fused silica), the biaxial moduli and the thermal expansion coefficients of the films were estimated.
Properties of Dielectric Coatings Produced by Ion Assisted Deposition.

PF GU,YM CHEN,XQ HU,JF TANG

DOI: https://doi.org/10.1364/ao.28.003318

IF: 1.9

1989-01-01

Applied Optics

Abstract:Some metal oxides, fluorides, and ZnS films deposited by ion assisted deposition are investigated as a function of ion energy, ion variety, and ion source type. Both optical and mechanical properties, such as optical stability, absorption and scattering losses, laser damage threshold, and durability, are examined for samples deposited with the assistance of four kinds of ion source and various preparation conditions.
Optical and Wetting Properties of CuAlO2 Films Prepared by Radio Frequency Magnetron Sputtering

Junlei Li,Xian Wang,Shiwei Shi,Xueping Song,Jianguo Lv,Jingbiao Cui,Zhaoqi Sun

DOI: https://doi.org/10.1111/j.1551-2916.2011.04943.x

IF: 4.186

2011-01-01

Journal of the American Ceramic Society

Abstract:The CuAlO2 films were prepared on glass and quartz substrates by radio frequency magnetron sputtering with a sintered target composed of Al(OH)3 and Cu2O powders. X-ray diffraction analyses reveal that the as-deposited films are amorphous structure and the as-annealed films are predominated by the CuAlO2 phase along with the Al2O3 phase. Scanning electron microscope (SEM) measurements indicate that grains grow up and surface becomes rougher as a result of increasing temperature. The optical studies show that annealing leads to the reduction of the average transmittance of the films from 60% to 40% for the visible range and the decrease of the fitted refractive index from 2.0 to 1.5. Direct band gaps confirmed by the transmittance and reflectance measurements are estimated to be 3.86 and 3.50 eV for as-deposited and as-annealed films, respectively. As increasing exposure time, water contact angles of the as-deposited films exposed under ultraviolet light source 365 nm or 254 nm decrease from 96.3° and 96.4° to 87.5° and 87.2°, respectively. The variation of contact angle can be attributed to the hydrophobic organic stains on the surface, surface roughness, the formation of Cu2+, and band gap variation of CuAlO2 film. The as-annealed film becomes hydrophilic and its water contact angle is 31.1°. The wetting property of CuAlO2 films is very important for the wide spread application of this material.
Optimization of PECVD silicon oxynitride films for anti-reflection coating

Yongjin Wang,Xinli Cheng,Zhilang Lin,Changsheng Zhang,Feng Zhang

DOI: https://doi.org/10.1016/j.vacuum.2003.09.004

IF: 4

2003-11-01

Vacuum

Abstract:In this work, amorphous silicon oxynitride films were deposited on silicon substrates by plasma-enhanced chemical vapor deposition (PECVD). The main purpose was to use silicon oxynitride film as a single-layer anti-reflection coating for Si-based optoelectronic devices. The chemical information was measured by infrared spectroscopy. Surface and cross-section morphology was determined by a scanning electron microscope. Spectroscopic ellipsometry (SE) was applied to measure the refractive index, extinction coefficient and thickness. The results of SE presented the refractive indices varied in the range of 1.83–1.92 by altering SiH4/NH3 ratio. One-side polished silicon substrate coated with silicon oxynitride film exhibited low reflectance, and two-side polished silicon substrate coated with silicon oxynitride film exhibited high transmittance. The results suggested that silicon oxynitride film was a very attractive single-layer anti-reflection coating.

materials science, multidisciplinary,physics, applied
Omnidirectional Sio2 Ar Coatings

Sadaf Bashir Khan,Hui Wu,Zhengjun Zhang

DOI: https://doi.org/10.3390/coatings8060210

IF: 3.236

2018-01-01

Coatings

Abstract:It is of great importance to develop antireflective (AR) coatings and techniques because improved optical performance has been progressively prerequisite for wide-ranging applications such as flat panel displays, optoelectronic devices or solar cells. Natural surroundings inspire researchers considerably to impersonate in order to provoke analogous characteristics via artificial approaches, which provide the opportunity for emerging techniques and development in material engineering. Herein, SiO2 antireflective (AR) coatings comprised of two layers were fabricated using a physical vapour deposition method via glancing angle. The top layer fabricated at an oblique angle of 80 degrees and the bottom layer close to the substrate was deposited at a deposition angle of 0 degrees. The experimental outcomes demonstrate that there is a slight influence on the refractive index of thin films by changing the morphology of nanostructures keeping deposition angles the same. The top layer shows a periodic arrangement of SiO2 nanostructures while the bottom stratum represents a SiO2 compact dense layer. The assembled bilayer SiO2 AR coating retains omnidirectional AR efficiency and tunability at a preferred wavelength range displaying <1% reflectance. Moreover, the fabricated omnidirectional SiO2 AR coatings have thermal stability up to 300 degrees C. These SiO2 AR coatings also possess negative temperature resistivity to withstand different cold storage conditions. Hence, the flexible and environmental adaptive SiO2 AR coating offers an intriguing route for imminent research in optics.
Structure related optical properties of electron beam evaporated ZrO2:10%SiO2 thin films

S. Jena,R. B. Tokas,S. Thakur,N. K. Sahoo,R.B. Tokas,N.K. Sahoo

DOI: https://doi.org/10.48550/arXiv.1403.4794

2014-03-19

Materials Science

Abstract:ZrO2:10%SiO2 thinfilms have been deposited on fused silica substrate by reactive electron beam co-evaporation technique at different oxygen partial pressure. The structural analysis shows tetragonal phase with residual tensile stress in the films. The intensity of the tetragonal t(110) phase are found increasing with increasing oxygen pressure. The optical band gap is found increasing from 5.06 eV to 5.28 eV because of increasing crystalinity of monoclinic phase, while the film grain size remains almost constant with increase of oxygen pressure, concludes that the crystallite or grain size has no effect on the optical properties of the films. The dispersion of the refractive index is discussed in terms of single oscillator Wimple-DiDomenico model. The dispersion energy parameter better known as structural order parameter are found increasing with the intensity of t(110) phase. It is observed that films having higher value of order parameter show lower surface roughness which concludes that the local microstructure ordering can predominantly influence the grain morphology which in turn can lead to better surface for higher value of order parameter.
Physical and Optical Properties of ZnO Thin Films Grown by DC Sputtering Deposition

Tao Chen,Shu-Yi Liu,Christophe Detavernier,R. L. Van Meirhaegbe,Xin-Ping Qu

DOI: https://doi.org/10.1109/icsict.2008.4734639

2008-01-01

Abstract:The effects of the deposition condition of DC sputtering on the properties of ZnO thin films were systematic investigated. ZnO films have been prepared by DC sputtering on the Si and glass substrates in the Ar and O2/Ar ambient with different substrate temperature ranging from room temperature to 300°C. Optimal results of the ZnO film were obtained with a deposition temperature of 300°C in the O2/Ar ambient. The film has a preferential orientation of (002) and the Zn to O ratio is stoichiometric with a strong band-edge emission in the ultraviolet region. All the films deposited on glass have an optical transmittance over 80 % in the wavelength ranging from 400 nm to 800 nm.
Preparation of SiO2:TiO2 for High-Performance Double Layer Anti-Reflection Coating

Shahed Zeyed,Alaa Nazar Abd Algaffar

DOI: https://doi.org/10.30723/ijp.v21i2.1110

2023-06-01

Iraqi Journal of Physics

Abstract:In this work, an anti-reflection coating was prepared in the region (400-1000) nm of wavelength, with a double layer of silicon dioxide (SiO2) as an inner layer and the second layer of the mixture (SiO2) and titanium dioxide (TiO2) with certain ratios, as an outer layer using the chemical spraying method with a number of 6 sprays of layer SiO2 and 12 sprays of layer SiO2 - TiO2. Using the method of chemical spraying deposited on the glass as a substrate with a different number of sprays of SiO2, and a fixed number of TiO2-SiO2. The optical and structural properties were determined using UV-Vis spectroscopy and atomic force microscopy (AFM). The results show that by using a mixed layer, the optimal optical performance of a broadband low-reflection ARC (anti-reflection coating) was obtained. The work also reports the comparison of experimental and theoretical results with the help of MATLAB, which relies on the characteristic matrix along the visible region – near-infrared.

English Else

Optical and stress properties of ZrO_2/SiO_2 and TiO_2/SiO_2 anti-reflective coatings deposited by ion-beam-assisted deposition on a flexible substrate

Study on the Mechanism and Measurement of Stress of Tio2 and Sio2 Thin-Films

Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

PREPARATION AND TRIBOLOGICAL PROPERTIES OF TiO2-ZrO2 THIN FILMS

The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

Optical Properties of Thin Oxide Films Produced by Energetic Ion Beams

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering

Optical and anisotropic stress properties of flexible (Ta2O5/SiO2)2 antireflection film deposited by E-gun evaporation with ion-beam assisted deposition

ZrO2-TiO2 thin films: A new material system for mid-infrared integrated photonics

Characterization of SiO2 and TiO2 films prepared using rf magnetron sputtering and their application to anti-reflection coating

Infrared And Raman Spectroscopic Studies Of Optically Transparent Zirconia (Zro2) Films Deposited By Plasma-Assisted Reactive Pulsed Laser Deposition

Effect of ionic oxygen concentration on properties of SiO2 and Ta2O5 monolayers deposited by ion beam sputtering

Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region

Properties of Dielectric Coatings Produced by Ion Assisted Deposition.

Optical and Wetting Properties of CuAlO2 Films Prepared by Radio Frequency Magnetron Sputtering

Optimization of PECVD silicon oxynitride films for anti-reflection coating

Omnidirectional Sio2 Ar Coatings

Structure related optical properties of electron beam evaporated ZrO2:10%SiO2 thin films

Physical and Optical Properties of ZnO Thin Films Grown by DC Sputtering Deposition

Preparation of SiO2:TiO2 for High-Performance Double Layer Anti-Reflection Coating