Abstract:Carbon nitride films were deposited on Co/Ni-covered Si(100) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20–30nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that β- and graphitic-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34–0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323cm−1) that indicates the presence of C3N4 components, and a graphitic G band (around 1593cm−1). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed.

INCORPORATION EFFECT OF NITROGEN INTO Nc-Sin_x:H FILMS

Effect Of Nitrogen And Hydrogen On The Crystallization Of Nanocrystalline Silicon Nitrogen Films

Doping Effects in Co-deposited Mixed Phase Films of Hydrogenated Amorphous Silicon Containing Nanocrystalline Inclusions

Effects of Nitrogen Impurities on the Microstructure and Electronic Properties of P-Doped Si Nanocrystals Emebedded in Silicon-Rich Sinx Films

Effect of the Nitrogen Incorporation on the Microstructure and Photoelectric Properties of N Type Nanocrystalline Silicon Thin Films.

Structure Of Nc-Si : H Films

Preparation of noncrystalline silicon carbon films by using heavily hydrogen diluted silane and ethene

Study on crystallization of hydrogenated nanocrystalline silicon carbon films

Deposition and Thermoelectric Properties of N-Doped SiC Thick Films

Density functional theory study on a 1.4 nm silicon nanocrystal coated with carbon

Nitrogen Modification of Hydrogenated Amorphous Carbon Films

Effect of the deposition conditions on the morphology and bonding structure of SiCN films

Characterization of the Interface Region During the Agglomeration of Silicon Nanocrystals in Silicon Dioxide

Structural Nature of Nanocrystalline Silicon

Preparation and Photoluminescence of Nanocrystalline Si-Rich Silicon Oxide Films by Pecvd

Effect of N_2O Plasma Treatment on Luminescence of Silicon-rich Silicon Nitride Films

Formation of the thermal donors in the hydrogen-implanted nitrogen-doped silicon crystal

Effect Of Nitrogen Doping On The Dissolution Of Oxygen Precipitates In Czochralski Silicon During Rapid Thermal Annealing

Synthesis of Nanocrystalline Carbon Nitride Films by Glow Discharge Plasma Beam Deposition

Microstructure and Photoelectric Properties of P-Doped Silicon-Rich Sinx Film As an N-Type Layer for Pin-Type Amorphous Silicon Thin Film Solar Cells

Microstructures and Optical Properties of SiNx Films