Abstract:Nitrogen-doped Czochralski (NCZ) silicon has been a base material for integrated circuits. The interaction between nitrogen (N) and interstitial oxygen (Oi) atoms in the low temperature regime (300–650 °C), which leads to N–O complexes in the form of NOx (x = 1, 2, or 3), forms a series of shallow thermal donors (denoted as N–O STDs). Such N–O STDs are detrimental to the stability of electrical resistivity of NCZ silicon. In this work, we have experimentally investigated the elimination of N–O STDs in NCZ silicon by means of conventional furnace anneal (CFA) and rapid thermal anneal at elevated temperatures ranging from 900 to 1250 °C, aiming to explore the underlying mechanism. It is found that most of the N–O STDs formed in NCZ silicon can be eliminated by a very short period of anneal at the aforementioned temperatures, providing solid evidence for the viewpoint that the elimination of N–O STDs is ascribed to the decomposition of NOx complexes. Somewhat unexpectedly, the residual N–O STDs are much more after the 1250 °C/2 h CFA than after the 900 °C/2 h or 1000 °C/2 h counterpart, which is found to be due to the fact that more nitrogen pairs [(N2)s] are remaining after the 1250 °C/2 h CFA. It is proposed that most of the (N2) atoms are involved in the growth of grown-in oxide precipitates during the 900 or 1000 °C/2 h CFA. The first-principles calculations and molecular dynamics simulation indicate that the elimination of N–O STDs is essentially ascribed to the destruction of “NO ring” that is the core of NOx complexes. Furthermore, based on the experimental and theoretical results, we have made a thorough thermodynamic analysis to account for the details of elimination of N–O STDs as revealed in this work. It is believed that our experimental and theoretical studies have gained more insight into the N–O STDs in NCZ silicon.

Characterization of the Interface Region During the Agglomeration of Silicon Nanocrystals in Silicon Dioxide

Positron annihilation spectroscopy of the interface between nanocrystalline Si and SiO2

Nanocrystalline Si Studied by Beam-Based Positron Annihilation Spectroscopy

Effect Of Nitrogen Doping On The Dissolution Of Oxygen Precipitates In Czochralski Silicon During Rapid Thermal Annealing

Oxygen Annealing Behavior in Multicrystalline Silicon

Stress Dependent Structure of Annealed Nitrogen-Doped Cz-Si

Thermal Acceptor Formation in Nitrogen-Doped Silicon

Enhanced Oxygen Precipitation In Neutron-Irradiated Nitrogen-Doped Czochralski Silicon Crystal

Thermal Nitridation Kinetics of Silicon Wafers in Nitrogen Atmosphere During Annealing

Bonding of oxygen at the oxide/nanocrystal interface of oxidized silicon nanocrystals: An ab initio study

On the Mechanism Underlying the Elimination of Nitrogen-Oxygen Shallow Thermal Donors in Nitrogen-Doped Czochralski Silicon at Elevated Temperatures

Transmission Electron Microscopic Observation of Oxygen Precipitates in Nitrogen-Doped Silicon

Annealing Effects on the Size of Si-nanocrystals Embedded in Bulk SiO

Thermal Stability of Oxygen Precipitates in Nitrogen-Doped Czochralski Silicon

Influence of annealing on microstructures and photoluminescence of nano-composite silicon film

Nanocrystal formation in Si implanted thin SiO2 layers under the influence of an absorbing interface

Oxygen-related Vacancy-Type Defects in Ion-Implanted Silicon

Characterization of amorphous and crystalline silicon nanoclusters in ultra thin silica layers

Crystallization and Disappearance of Defects of the Annealed Silicon Nanowires

Density functional theory study on a 1.4 nm silicon nanocrystal coated with carbon

Thermal History Effect on the Nucleation of Oxygen Precipitates in Germanium Doped Cz-silicon Studied by High-Energy X-ray Diffraction