Effect of Substrate Temperature on Crystallization Behavior of NiTi Thin Films

Yong Li
IF: 1.8
2003-01-01
Materials Science and Technology
Abstract:NiTi thin films were deposited on hot substrate by D.C. magnetron sputtering at substrate temperatures of 350?370 ℃ and 420 ℃, respectively, the interfacial characteristics and the size of the crystalline particles in NiTi thin films were studied using Xray diffraction (XRD) and Smallangle Xray Scattering (SAXS), and the results show that the crystallization temperature is reduced, the films deposited on substrates above 350 ℃ are partly crystallized; the sizes of crystalline particles obtained are 240 nm?259 nm and 281 nm, for substrate temperatures of 350 ℃?370 ℃ and 420 ℃ respectively;and the crystalline particles of NiTi film deposited on heated substrate have a sharp interface between crystallized and amorphous phases.
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