Abstract:Monophasic and homogeneous Ni10Zr7 nanocrystalline alloy films were successfully grown at room temperature by co-sputtering in an indigenously developed three-gun DC/RF magnetron sputtering unit. The films could be produced with long-range crystallographic and chemical order in the alloy, thus overcoming the widely acknowledged inherent proclivity of the glass forming Ni-Zr couple towards amorphization. Crystallinity of these alloys is a desirable feature with regard to improved efficacy in applications such as hydrogen storage, catalytic activity and nuclear reactor engineering, to name a few. Thermal stability of this crystalline phase, being vital for transition to viable applications, was investigated through systematic annealing of the alloy films at 473 K, 673 K and 923 K for various durations. While the films were stable at 473 K, the effect of annealing at 673 K was to create segregation into nanocrystalline Ni (superparamagnetic) and amorphous Ni+Zr (non-magnetic) phases. Detailed analyses of the physical and magnetic structures before and after annealing were performed through several techniques effectual in analyzing stratified configurations and the findings were all consistent with each other. Polarized neutron and X-ray reflectometry, grazing incidence x-ray diffraction, time-of-flight secondary ion mass spectroscopy and X-ray photoelectron spectroscopy were used to gauge phase separation at nanometer length scales. SQUID based magnetometry was used to investigate macroscopic magnetic properties. Simulated annealing performed on this system using molecular dynamic calculations corroborated well with the experimental results. This study provides a thorough understanding of the creation and thermal evolution of a crystalline Ni-Zr alloy.

Effect of processing conditions on microstructure and electrical characteristics of Ni thin films

The Effects of Extended Heat Treatment on Ni Induced Lateral Crystallization of Amorphous Silicon Thin Films

Study of Nanocrystalline Fe-Al-N Soft Magnetic Thin Films

Microstructural and electrical behavior of NiCr/Al nanomultilayered films prepared by magnetron sputtering

Effects of Cr buffer layer thickness on the microstructure and the properties of Ni thin films deposited on polyimide substrate

Substrate Temperature Effect on Growth Behavior and Microstructure-Properties Relationship in Amorphous Ni-Nb Thin Films

Temperature effect on structural, mechanical properties and corrosion behaviour of CrN thin films deposited by magnetron sputtering

Effect of Cr on solidification structure and microhardness of Al-Ni alloy

Controlling the Superconducting Critical Temperature and Resistance of NbN Films through Thin Film Deposition and Annealing

In-Situ Tem Study of the Thickness Impact on the Crystallization Features of A Near Equal-Atomic Tini Thin Film Prepared by Planar Magnetron Sputtering

Individual Layer Thickness Dependence of Microstructure and Mechanical Properties of Magnetron Sputtering Mo-W-Doped Ni/Ni3Al Multilayers

Microstructure and Mechanical Properties of Co-Deposited Ti-Ni Films Prepared by Magnetron Sputtering

Effect of Annealing on Stress, Microstructure, and Interfaces of NiV/B4C Multilayers

Effects of Process Conditions on Properties of Electroplated Ni Thin Films for Microsystem Applications

Effects of Substrate Temperature and Post-Annealing on Microstructure and Properties of (alcrnbsitiv)n Coatings

Annealing Effects on the Magnetic Properties of Nanocrystalline FeNbB Thin Films

Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024)

Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity

Post-deposition annealing effects on microstructure, mechanical and tribological properties of AlCrN films

Thermal evolution of nanocrystalline co-sputtered Ni-Zr alloy films: Structural, magnetic and MD simulation studies

Surface Configurations During Annealing of Sputter-Deposited NiTi Thin Films