Two-colour In0.5Ga0.5As Quantum Dot Infrared Photodetectors on Silicon
Daqian Guo,Qi Jiang,Mingchu Tang,Siming Chen,Yuriy I. Mazur,Y. Maidaniuk,Mourad Benamara,Mykhaylo P. Semtsiv,William T. Masselink,Gregory J. Salamo,Huiyun Liu,Jiang Wu
DOI: https://doi.org/10.1088/1361-6641/aad83c
IF: 2.048
2018-01-01
Semiconductor Science and Technology
Abstract:An InGaAs quantum dot (QD) photodetector is directly grown on a silicon substrate. GaAs-on-Si virtual substrates with a defect density in the order of 106 cm−2 are fabricated by using strained-layer superlattice as dislocation filters. As a result of the high quality virtual substrate, fabrication of QD layer with good structural properties has been achieved, as evidenced by transmission electron microscopy and x-ray diffraction measurements. The InGaAs QD infrared photodetector is then fabricated on the GaAs-on-Si wafer substrate. Dual-band photoresponse is observed at 80 K with two response peaks around 6 and 15 μm.