Infrared Absorption in SiGe/Si Multiple Quantum Wells

SL GU,RH WANG,P HAN,LQ HU,R ZHANG,YD ZHENG
DOI: https://doi.org/10.1016/0749-6036(92)90311-r
IF: 3.22
1992-01-01
Superlattices and Microstructures
Abstract:Infrared absorption has been used to investigate the subband structures in SiGe/Si quantum wells. The quantum wells are prepared using RRH/VLP-CVD and consist of 20 periods of SiGe(6nm)Si(20nm) and 60 periods of SiGe(4nm)Si(40nm). The good periodical and interface sharpness of the SiGe/Si quantum wells have been shown by Auger Electron Spectroscopy (AES). The absorption peaks due to transitions between the hole subbands and the conduction band have been observed in infrared absorption spectra. The transverse photocurrent spectrum parallel to the growth plane have also shown absorption peaks due to transitions between the heavy and light hole band states and the conduction band states in quantum wells.
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