Infrared Optical Absorbance of Intersubband Transitions in GaN/AlGaN Multiple Quantum Well Structures

QY Zhou,JY Chen,B Pattada,MO Manasreh,FX Xiu,S Puntigan,L He,KS Ramaiah,H Morkoc
DOI: https://doi.org/10.1063/1.1577809
IF: 2.877
2003-01-01
Journal of Applied Physics
Abstract:Intersubband transitions in Si-doped molecular beam epitaxy grown GaN/AlGaN multiple quantum wells on c-plane sapphire were investigated using the Fourier-transform infrared optical absorption technique. Several GaN quantum well samples were grown with either AlGaN bulk or GaN/AlGaN short period superlattice barriers. The measurements were made in a waveguide configuration utilizing a facet polished at 45° to the c plane. The integrated area of the intersubband transitions in several waveguides cut from different location of the wafer was measured, from which we estimated the two-dimensional electron gas density (σ). The measured values of σ are about two orders of magnitude larger than the Si doping level of ∼8×1017 cm−3, which is consistent with the polarization effects, particularly considering the large number of GaN/AlGaN interfaces. The internal quantum efficiency of the intersubband transitions was estimated to be on the order of 40% for samples with superlattice barriers.
What problem does this paper attempt to address?