Study of Si-Based Multilayer Ge Quantum Dots Near-Infrared Photodetector

Jianyuan WANG,Songyan CHEN,Cheng? LI
DOI: https://doi.org/10.3969/j.issn.1004-1699.2015.05.009
2015-01-01
Abstract:The structure of multilayer Ge quantum dots( QDs) was eptaxial grown on Si substrate by ultra-high vacu-um chemical vapor deposition( UHV/CVD) technique for detector fabrication. The intrinsic multilayer Ge QDs were acted as an absorption region,while the N-Si substrate and the in situ capped P-Si layer were chosen for the forma-tion of ohmic contact. The fabricated photodetector has a low dark current density(7.35×10-6 A/cm2 at -1 V),and the wavelength limit is extended to 1.31 μm compared with Si photodetector.
What problem does this paper attempt to address?