Abstract:In this article, the long-lasting antifogging capability of large-aperture optical components was obtained by the in-situ plasma treatment. Water contact angle and surface free energy were used to study the overall antifogging evolution of optical components in the air. The optical performance, including laser-induced damage threshold and surface morphology, were discussed after plasma cleaning. Elements contents and functional groups information were analyzed by X-ray photoelectron spectroscopy detection as a reference to simulation results. In molecule dynamics simulations, the substrates of fused quartz were modified by linking various functional groups (-H, –OH, –CHO, –COOH, –NH2) to simulate the surface of optical components after plasma treatment at a microscopic level. Experimental results showed that the surface of the optical components (fused quartz, sol-gel antireflection film, multilayer dielectric film) treated by plasma had a good antifogging effect, which can be maintained for 300 min. The surface wettability of optical components was improved significantly after plasma treatment, which was supported mainly by the polar components in the surface free energy. Besides, The optical performance of the components was enhanced while the surface structure was barely damaged. According to simulation results, it was found that –CHO, –COOH, and –NH2 played a dominant role in improving the hydrophilicity of optical components, compared with -H, –OH. The hydrophilic surfaces after plasma modification were obtained because more hydrogen bonds were generated between the surface functional groups and the water molecules. The above research provides a new method and a theoretical basis for improving the long-lasting antifogging for large-aperture optical components.

In-situ Cleaning Organic Contaminants on SiO2 Sol-Gel Antireflection Film by Low-Pressure Air Plasma

In situ plasma cleaning of large-aperture optical components in ICF

Removal of Particle Contaminations on Sol-Gel Coated Fused Silica Surface by Laser Cleaning

Long-lasting antifogging mechanism for large-aperture optical surface in low-pressure air plasma in-situ treated

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Microscopic Chemical Reaction Mechanism of Carbon Contaminants on the Surface of Pulse-compressed Gratings Cleaned by Low-pressure Plasma

Investigation of electrode-driven hydrogen plasma method for in situ cleaning of tin-based contamination

Study on the Surface Morphology of Micro-Particles and the Oxide Layer on Silicon Carbide Crystal Using Nanosecond Green Laser Cleaning Assisted with Airflow

In-Situ Cleaning of Carbon-Contaminated Optical Components in Beam-Line of Synchrotron Radiation Light Source

Study of Form Control Algorithm in Atmospheric Pressure Plasma Processing

In-situ non-destructive removal of tin particles by low-energy plasma for imitation of EUV optical mirrors self-cleaning

Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2.

Plasma assisted remediation of SiC surfaces

RF plasma cleaning of optical surfaces: A study of cleaning rates on different carbon allotropes as a function of RF powers and distances

Towards Investigating Surface Quality of Single-Crystal Silicon Optics Polished with Different Processes

Characterization of Carbon-Contaminated B4C-Coated Optics after Chemically Selective Cleaning with Low-Pressure RF Plasma

In Situ Monitoring of Non-Thermal Plasma Cleaning of Surfactant Encapsulated Nanoparticles

A recycling strategy of ion beam removal and recoating of sol-gel film on fused silica surface

Reaction analysis and the removal mechanism of organic contaminants in plasma cleaning: a molecular dynamics simulation

Influence of reactive oxygen species concentration and ambient temperature on the evolution of chemical bonds during plasma cleaning: a molecular dynamics simulation

Use of plasma process diagnostic sensors for the monitoring of in situ dry cleaning of plasma enhanced chemical vapor deposition chamber