Abstract:In ITER, the metallic first mirrors (FMs) will undergo erosion due to their proximity to the fusion plasma and deposition of materials originated from the first walls (mainly beryllium). In-situ plasma cleaning is a promising technique to conserve the FMs optical properties by means of ion sputtering. In this work, the evolution of the optical properties of single-crystal (Sc) and nanocrystalline (Nc) molybdenum (Mo) and rhodium (Rh) mirrors were investigated up to 100 cycles of consecutive contamination and cleaning. Aluminum oxide (Al 2 O 3 ) was used as contaminant to replace the toxic beryllium. The plasma cleaning was carried out using a capacitively coupled argon (Ar) plasma excited by a 60 MHz radio-frequency generator resulting in the formation of a self-bias applied on the mirrors of -280 V. The plasma potential being around 30 V, the Ar ion energy was about 310 eV. The optical properties of the mirrors were assessed using ex-situ reflectivity measurements. Moreover, the surface topography was characterized by means of scanning electron microscopy (SEM), focused ion beam (FIB) and roughness measurements using atomic force microscopy (AFM). ScMo and ScRh mirrors formerly exposed to 80 successful cleaning cycles using aluminum/tungsten (Al/W) deposits and air storage exhibit drastic changes in their optical properties after being subject to cleaning cycles using Al 2 O 3 as contaminant. Additionally, freshly polished ScRh were exposed to identical cleaning cycles. All Sc mirrors exhibited pits induced by the polishing procedure using diamond paste in addition of mounds/wavy patterns. The carbon incorporated during the polishing process was demonstrated to be responsible for the pitting of the surface. The Nc mirrors preserved their initial reflectivities after up to 100 cycles. The surface topography was systematically characterized and an average erosion rate for NcRh mirrors of about 59 nm per cycle has been estimated from FIB cross-sections. The optical properties of the Nc mirrors showed a superiority in the present study in comparison to the Sc materials due to the influence of their polishing procedures.

Characterization of Carbon-Contaminated B4C-Coated Optics after Chemically Selective Cleaning with Low-Pressure RF Plasma

Towards chemically neutral carbon cleaning processes: Plasma cleaning of Ni, Rh, and Al reflective optical coatings and thin Al filters for Free Electron Lasers and synchrotron beamline applications

High Heat Flux Testing of B4C/Cu and SiC/Cu Functionally Graded Materials Simulated by Laser and Electron Beam

RF plasma cleaning of optical surfaces: A study of cleaning rates on different carbon allotropes as a function of RF powers and distances

Plasma Cleaning of Contaminated Optical Components of Synchrotron Radiation Beam-Line

Characteristics of Back Corona Discharge in a Honeycomb Catalyst and Its Application for Treatment of Volatile Organic Compounds.

In-Situ Cleaning of Carbon-Contaminated Optical Components in Beam-Line of Synchrotron Radiation Light Source

Nonequilibrium Plasma Cleaning of Organic Contaminants on the Surface of Diffraction Gratings

In situ plasma cleaning of large-aperture optical components in ICF

The Mechanism Study of Low-Pressure Air Plasma Cleaning on Large-Aperture Optical Surface Unraveled by Experiment and Reactive Molecular Dynamics Simulation

Plasma Cleaning of LCLS-II-HE verification cryomodule cavities

In-situ Cleaning Organic Contaminants on SiO2 Sol-Gel Antireflection Film by Low-Pressure Air Plasma

Microscopic Chemical Reaction Mechanism of Carbon Contaminants on the Surface of Pulse-compressed Gratings Cleaned by Low-pressure Plasma

Spectral Diagnosis of in Situ Plasma Cleaning in Large-Aperture Optical Components: Reactive Species Characterization and Prediction of Cleaning

Reactive Expansion of Laser-Induced Boron/carbon Plasma in ECR Nitrogen Plasma During the Deposition of BCN Films

Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

Morphological modification of Rh-C coatings upon low-energy Ar + ion sputtering

Surface modification of ITER-like mirrors after one hundred cleaning cycles using radio-frequency plasma

Spectroscopic Characterization of Plasmas Generated by ECR Microwave Discharge of N2 Gas and Pulsed Laser Ablation of a B4C Target

Low RF power plasma ignition and detection for in-situ cleaning of 1.3 GHz 9-cell cavities

Ablation behavior of boron-modified phenolic resin irradiated by high-energy continuous-wave laser and its evolution of carbon structure