Abstract:Energy flux measurements by a calorimetric probe in a rf-magnetron plasma used for the deposition of super-hard c-BN coatings are presented and discussed. Argon as working gas is used for sputtering a h-BN target. Adding a certain amount of N2 is essential for the formation of stoichiometric BN films, since a lack of nitrogen will lead to boron rich films. Subsequently, the contributions of different plasma species, surface reactions, and film growth to the resulting variation of the substrate temperature in dependence on nitrogen admixture are estimated and discussed. In addition, SRIM simulations are performed to estimate the energy influx by sputtered neutral atoms. The influence of magnetron target power and oxygen admixture (for comparison with nitrogen) to the process gas on the total energy flux is determined and discussed qualitatively, too. The results indicate that variation of the energy influx due to additional nitrogen flow, which causes a decrease of electron and ion densities, electron temperature and plasma potential, is negligible, while the admixture of oxygen leads to a drastic increase of the energy influx. The typical hysteresis effect which can be observed during magnetron sputtering in oxygen containing gas mixtures has also been confirmed in the energy influx measurements for the investigated system. However, the underlying mechanism is not understood yet, and will be addressed in further investigations.

Reactive Expansion of Laser-Induced Boron/carbon Plasma in ECR Nitrogen Plasma During the Deposition of BCN Films

Spectroscopic Study on Pulsed Laser Ablation of Graphite Target in Ecr Nitrogen Plasma for Carbon Nitride Film Deposition

Spectroscopic Characterization of Plasmas Generated by ECR Microwave Discharge of N2 Gas and Pulsed Laser Ablation of a B4C Target

Enhancement of the properties of pulsed laser-deposited carbon nitride by the synchronisation of laser and N2 gas jet pulses

Composition and Structure of BCN Films Prepared by Ion Beam-Assisted Pulsed Laser Deposition

Characterization of plasma and gas-phase chemistry during boron-nitride nanomaterial synthesis by laser-ablation of boron-rich targets

Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition of Boron Carbon Nitride Films

Spectroscopic Study on the Enhanced Excitation of an Electron Cyclotron Resonance Nitrogen Plasma by Pulsed Laser Ablation of an Aluminum Target.

Study On Re-Sputtering During Cnx Film Deposition Through Spectroscopic Diagnostics Of Plasma

Formation of Diatomic Molecular Radicals in Reactive Nitrogen-Carbon Plasma Generated by Electron Cyclotron Resonance Discharge and Pulsed Laser Ablation

Synthesis of C3N4+ by the Combination of Laser Ablation of Graphite and N2 Molecular Beam

Investigation On Optical Emission Spectra During Ecr Plasma Enhanced Magnetron Sputtering Carbon Nitride Film Deposition

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

Characterization of carbon nitride deposition from CH#14#2/N#12#2 glow discharge plasma beams using optical emission spectroscopy

Characterization of Carbon Nitride Deposition from CH4∕N2 Glow Discharge Plasma Beams Using Optical Emission Spectroscopy

Energy fluxes in a radio-frequency magnetron discharge for the deposition of superhard cubic boron nitride coatings

A New Reactive Pulsed Laser Ablation Technique for the Deposition of Hard Carbon and Carbon-Nitride Thin Films

Dynamics of laser-ablated carbon plasma: formation of C2 and CN.

Synthesis of BCN thin films by nitrogen ion beam assisted pulsed laser deposition from a B4C target

BN Films Deposited by HFPECVD and the Mechanism of the Process

Carbon Nitride Films Produced Using Electron Cyclotron Resonance Nitrogen Plasmas