Abstract:Starting from solid-solutions (SS) of AlCoCrFeNix high-entropy alloys (HEAs) that have been produced with high purity constituent elements by vacuum arc remelting (VAR) method varying the nickel molar ratio x from 0.2 to 2.0, we investigated the synthesis of protective thin films of HEAs and high-entropy nitrides (HENs) with the aid of the pulsed laser deposition (PLD) system. The structure of all ten available bulk targets have been examined by means of X-Ray Diffraction (XRD), as well as their elemental composition by means of energy dispersion X-ray spectroscopy (EDS). Three targets with nickel molar composition x = 0.4, 1.2 and 2.0 corresponding to BCC, mixed BCC and FCC, and finally FCC structures were used for thin film depositions using a KrF excimer laser. The depositions were performed in residual low vacuum (10−7 mbar) and under N2 (10−4 mbar) at room temperature (RT~25 °C) on Si and glass substrates. The deposited films' structure was investigated using grazing incidence XRD, their surface morphology, thickness and elemental composition by scanning electron microscopy (SEM), EDS and X-ray photoelectron spectroscopy (XPS), respectively. A homemade four-point probe (4PP) set-up was applied to determine layers electrical resistance. Besides, a Nanoindentation (NI) was employed to test films' mechanical properties. XRD results showed that all deposited films, regardless of the initial structure of targets, were a mixture of FCC and BCC structures. Additionally, the quantitative and qualitative EDS and XPS results showed that the elemental composition of films was rather close to that of the targets. The depositions under an N2 atmosphere resulted in the inclusion of several percentage nitrogen atoms in a metallic nitride type compound into films, which may explain their higher electrical resistivity. The Young's modulus, nanohardness and friction coefficient values showed that the deposited films present good mechanical properties and could be used as protective coatings to prevent damage in harsh environments.

A New Reactive Pulsed Laser Ablation Technique for the Deposition of Hard Carbon and Carbon-Nitride Thin Films

Enhancement of the properties of pulsed laser-deposited carbon nitride by the synchronisation of laser and N2 gas jet pulses

Spectroscopic Study on Pulsed Laser Ablation of Graphite Target in Ecr Nitrogen Plasma for Carbon Nitride Film Deposition

Synthesis of C3N4+ by the Combination of Laser Ablation of Graphite and N2 Molecular Beam

Diamond-Like Carbon Thin-Film Deposition Using A Magnetically Confined Rf Pecvd System

TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition

Characterization and modification of carbon nitride films deposited by laser ablation under low energy ion‐beam bombardment

Characteristics of Thin High Entropy Alloy Films Grown by Pulsed Laser Deposition

Phases and Physical Properties of Carbon Nitride Thin Films Prepared by Pulsed Laser Deposition

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

Synthesis of Carbon Nitride Films by Arc-Heated Atomic Nitrogen Beams Assisted Pulsed Laser Ablation

Methodology of selective metallic thin film ablation from susceptible polymer substrate using pulsed femtosecond laser

Diamond-like Carbon Thin Films Prepared by ECR Argon Plasma Assisted Pulsed Laser Deposition

Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition of Boron Carbon Nitride Films

Cylindroid Rigid-Wall Simulation of the Influence of Gas Pressure in Pulsed Laser Deposition of LiNbO3 Films

Electron Cyclotron Resonance Plasma-assisted Reactive Pulsed Laser Deposition of Compound Films

Investigation of laser-induced changes in structural and optoelectrical properties of pulsed laser-deposited Diamond-Like Carbon layers

Thermal Stability of Carbon Nitride Thin Films Prepared by Electron Cyclotron Resonance Plasma Assisted Pulsed Laser Deposition

Nanocrystalline Diamond Film Grown by Pulsed Linear Antenna Microwave CVD

Influences of substrate bias on the composition and structure of carbon nitride thin films prepared by ECR-plasma assisted pulsed laser deposition

Spectroscopic Characterization of the Plasma Generated During the Deposition of AlxGa1−xN Films by Pulsed Laser Co-Ablation of Al and GaAs Targets in Electron Cyclotron Resonance Nitrogen Plasma