Abstract:Boron carbonitride (BCN) films were deposited by d.c. unbalanced magnetron sputter deposition where a substrate bias ranging from -50 V to -300 V was applied to the sample. X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy were used to confirm the composition and bonding structure of the BCN films. Surface morphology and roughness were analyzed by atomic force microscopy. The nano-mechanical properties and nano-scratch behavior of the prepared films were determined by a nano-indentation system equipped with continuous stiffness measurement and lateral-force measurement attachments. The results indicate that there is little change in the content of B, C, and N. The films deposited are compounds with hybridized B-C-N bonds and the disordered degree of the structure increases with increasing the substrate bias. The substrate biasing can enhance the nanohardness, elastic modulus, nano-scratch resistance, and cohesion strength of the deposited films. During the nano-scratch test, plastic deformation and ploughing wear appears for the BCN films deposited at lower bias. Elastic deformation becomes the dominant deformation mechanism for the films deposited at higher bias. The coefficient of friction between the deposited BCN films and the diamond tip depends on the loading critical load. The increasing of the substrate bias leads to the improvement of the critical load and the elastic deformation proportion.

Composition and Structure of BCN Films Prepared by Ion Beam-Assisted Pulsed Laser Deposition

Synthesis of BCN thin films by nitrogen ion beam assisted pulsed laser deposition from a B4C target

Mechanical Properties and Bonding Structure of Boron Carbon Nitride Films Synthesized by Dual Ion Beam Sputtering

Preparation of Thin Films of Carbon-Based Compounds

Turbostratic Boron Carbonitride Films Produced by Bias-Assisted Hot Filament Chemical Vapor Deposition

BN Films Deposited by HFPECVD and the Mechanism of the Process

Preparation of Boron Carbon Nitride Thin Films by Radio Frequency Magnetron Sputtering

Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition of Boron Carbon Nitride Films

Investigation of BCN Films Deposited at Various$hboxN_2/hboxAr$Flow Ratios by DC Reactive Magnetron Sputtering

Synthesis of Boron Carbonitride Films by Plasma-Based Ion Implantation

PREPARATION OF B-N FILMS BY ION BEAM ASSISTED DEPOSITION

Transition from amorphous boron carbide to hexagonal boron carbon nitride thin films induced by nitrogen ion assistance

Structural and Mechanical Properties of a-BCN Films Prepared by an Arc-Sputtering Hybrid Process

Ion-beam-assisted Deposition of CNx Films

A Study of Nano-Mechanical Properties and Nano-Scratch Behavior of Boron Carbonitride Films.

Reactive Expansion of Laser-Induced Boron/carbon Plasma in ECR Nitrogen Plasma During the Deposition of BCN Films

Preparation and Characterisation of Carbon Nitride Films Deposited by Pulsed Laser Arc Deposition

Microstructure and Tribological Behavior of BCN Thin Films with Different Nitrogen Contents

Microstructure And Properties Of Bcn Films

Synthesis and Analysis of SiBCN Films Obtained by Plasma-Enhanced Chemical Vapor Deposition from Triethylaminoborane, Hexamethyldisilazane, and Ammonia

Chemical Structure and Micro-Mechanical Properties of Ultra-Thin Films of Boron Carbide Prepared by Pulsed-Laser Deposition