Abstract:Amorphous boron carbide (B4C) thin films are by far the most popular form for the neutron converting layers in the 10B-based neutron detectors, which are a rising trend in detector technologies in response to the increasing scarcity and price of 3He, the standard material for neutron detection. The microstructure of the B4C films is closely related to the important properties, e.g. density and adhesion, for the converting layers, which eventually affect the detection efficiency and the long-term stability of the detectors. To study the influence from substrates of different roughness and materials, the B4C films were deposited on polished Si substrates with Al, Ti, and Cu buffer layers and unpolished Si, Al, Ti, and Cu substrates by direct current magnetron sputtering at a substrate temperature of 623 K. The tapered columnar grains and nodular defects, generally observed in SEM images, indicated a strong shadowing effect where voids were introduced around the grains. The change in the grain size did not show a direct dependence to the substrate roughness, acquired from the surface profile, nor to the mass density of the films, obtained from reflectivity patterns. However, films with non-uniform size of columnar grains were deposited on substrates with high skewness, leading to a drop of mass density from ~95 % down to ~70 % of tabulated bulk density. On the other hand, similar microstructures and mass density were obtained from the films deposited on Al, Ti, and Cu of different roughness and good adhesion were observed from cross-cut adhesion tests, showing the reliability of sputtering deposited B4C films on common structural materials in neutron detectors.

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Superhard Boron-Rich Boron Carbide with Controlled Degree of Crystallinity

Synthesis of boron carbide films by ion beam sputtering

Influence of Carbon Content on the Crystallographic Structure of Boron Carbide Films

Preparation of Thin Films of Carbon-Based Compounds

Electrical and Optical Properties of Boron‐doped Nanocrystalline Silicon Films Deposited by PECVD

Mechanical Properties and Bonding Structure of Boron Carbon Nitride Films Synthesized by Dual Ion Beam Sputtering

Boron films produced by high energy Pulsed Laser Deposition

Composition and Structure of BCN Films Prepared by Ion Beam-Assisted Pulsed Laser Deposition

Fabrication and characterization of hot-pressed B-rich boron carbide

Synthesis and Thermal Oxidation Resistance of Boron-Rich Boron-Carbide Material

Influence of Length-Scale on Stabilization of Boron Carbide in Al-based Metal Matrix Composites During Plasma Activated Sintering

Micro-Hardness and Adhesion of Boron Carbon Nitride Coatings

Effect of substrate roughness and material selection on the microstructure of sputtering deposited boron carbide thin films

Investigation of thickness dependent composition of boron carbide thin films by resonant soft x-ray reflectivity

Raman characterization of boron doped tetrahedral amorphous carbon films

Deposition of Thin Tungsten Carbide Films by Dual Ion Beam Sputtering Deposition

Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions

Thermostructural evolution of boron carbide characterized using in-situ x-ray diffraction

Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition of Boron Carbon Nitride Films

MECHANICAL PROPERTIES OF DIAMOND THIN FILMS CHARACTERIZED BY NANO-INDENTATION METHOD