Short Circuit Capability and Short Circuit Induced $v_{\mathrm{th}}$ Instability of a 1.2-Kv SiC Power MOSFET

Jiahui Sun,Jin Wei,Zheyang Zheng,Yuru Wang,Kevin J. Chen
DOI: https://doi.org/10.1109/jestpe.2019.2912623
IF: 5.462
2019-01-01
IEEE Journal of Emerging and Selected Topics in Power Electronics
Abstract:The withstand capability and threshold voltage (VTH) instability of 1.2-kV silicon carbide (SiC) MOSFETs under repetitive short circuit (SC) tests are investigated. An SC test system is constructed to apply repetitive SC stress to SiC MOSFETs and measure the transfer I-V characteristics and gate-to-source leakage current (I GSS ) after each set of SC tests. To evaluate the SC capability, repetitive SC tests with different SC durations (t p ) are conducted until device failure. The SC withstand time (SCWT) at 1000 SC cycles is found to be ~3.3 μs. V TH instability under repetitive SC tests prior to the device failure is characterized. A bidirectional V TH shift behavior, i.e., negative shift at shorter t p and positive shift at longer t p , was revealed. The V TH shifts under repetitive SC tests are attributed to the SC pulse process according to the results of high-temperature reverse bias (HTRB) and dynamic high-temperature gate bias (HTGB) tests. The underlying mechanisms of the complex V TH shift behavior are explained in a unified framework by taking into account the junction temperature (T j ) increase with longer t p . TCAD device simulation is used to help analyze the mechanisms.
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