A Water-Free Metal Organic Deposition Method For Yba2cu3o7-Delta Thin Film Fabrication
Rongxia Huang,Feng Feng,Wei Wu,Yunran Xue,Yanyi Zhang,Kai Shi,Timing Qu,Yongjie Zhao,Xiaohao Wang,Xiaowen Zhang,Zhenghe Han
DOI: https://doi.org/10.1088/0953-2048/26/11/115010
2013-01-01
Abstract:During the fabrication of YBa2Cu3O7-delta (YBCO) thin films via the metal organic deposition (MOD) method, the water content of the precursor solution should be reduced to prevent precipitation and other detriment. In most of the reported MOD-YBCO studies, water was used as a solvent, and vacuum distillation was utilized to reduce the water content of the precursor solution. In this study, we propose a water-free MOD method using propionic anhydride and methanol as the solvents. The crystal water of raw precursor salts was removed by heating, and the water content in the final precursor solution was as low as 0.2 wt%. Using this solution with low fluorine content and the optimized maximum temperature of pyrolysis, the final YBCO thin films about 250 nm thick had the critical current density (J(c)) of 3.8 MA cm(-2) (77 K, self-field). The water content of the precursor solution was further reduced to less than 10(-2) wt% by vacuum distillation. According to the J(c) performance, thermal analysis, x-ray diffraction investigations, and morphology observations, no significant improvement was found for the final YBCO thin films fabricated by the distilled solution, indicating that vacuum distillation is not necessary in the water-free MOD method.