H-Tailored Surface Conductivity in Narrow Band Gap In(Asn)

A. V. Velichko,A. Patane,M. Capizzi,I. C. Sandall,D. Giubertoni,O. Makarovsky,A. Polimeni,A. Krier,Q. Zhuang,C. H. Tan
DOI: https://doi.org/10.1063/1.4906111
IF: 4
2015-01-01
Applied Physics Letters
Abstract:We show that the n-type conductivity of the narrow band gap In(AsN) alloy can be increased within a thin (∼100 nm) channel below the surface by the controlled incorporation of H-atoms. This channel has a large electron sheet density of ∼1018 m−2 and a high electron mobility (μ > 0.1 m2V−1s−1 at low and room temperature). For a fixed dose of impinging H-atoms, its width decreases with the increase in concentration of N-atoms that act as H-traps thus forming N-H donor complexes near the surface.
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